文献
J-GLOBAL ID:201902239809718276
整理番号:19A1384915
オキシド-semiconductor/group-IV-半導体二重層トンネル電界効果トランジスタの材料設計【JST・京大機械翻訳】
Material design of oxide-semiconductor/group-IV-semiconductor bilayer tunneling field effect transistors
著者 (5件):
Kato Kimihiko
(Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan)
,
Matsui Hiroaki
(Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan)
,
Tabata Hitoshi
(Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan)
,
Takenaka Mitsuru
(Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan)
,
Takagi Shinichi
(Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2019
号:
EDTM
ページ:
85-87
発行年:
2019年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)