文献
J-GLOBAL ID:201902242684016669
整理番号:19A1417614
優れた陽極エレクトロクロミズムのための臨界リチウムドープ酸化ニッケル薄膜における格子と電子構造の変化【JST・京大機械翻訳】
Lattice and electronic structure variations in critical lithium doped nickel oxide thin film for superior anode electrochromism
著者 (6件):
He Yingchun
(School of Physics and Nuclear Energy Engineering, Beihang University, Beijing, 100191, PR China)
,
Li Tianzhao
(School of Physics and Nuclear Energy Engineering, Beihang University, Beijing, 100191, PR China)
,
Zhong Xiaolan
(School of Physics and Nuclear Energy Engineering, Beihang University, Beijing, 100191, PR China)
,
Zhou Miao
(School of Physics and Nuclear Energy Engineering, Beihang University, Beijing, 100191, PR China)
,
Dong Guobo
(School of Physics and Nuclear Energy Engineering, Beihang University, Beijing, 100191, PR China)
,
Diao Xungang
(School of Energy and Power Engineering, Beihang University, Beijing, 100191, PR China)
資料名:
Electrochimica Acta
(Electrochimica Acta)
巻:
316
ページ:
143-151
発行年:
2019年
JST資料番号:
B0535B
ISSN:
0013-4686
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)