文献
J-GLOBAL ID:201902244894408971
整理番号:19A1778993
ミスト化学蒸着により成長させた熱電AlドープZnO薄膜における多孔度調整熱伝導率【JST・京大機械翻訳】
Porosity-tuned thermal conductivity in thermoelectric Al-doped ZnO thin films grown by mist-chemical vapor deposition
著者 (11件):
Saini Shrikant
(Department of Mechanical Engineering, Kyushu Institute of Technology, Kitakyushu, Japan)
,
Mele Paolo
(Shibaura Institute of Technology, SIT Research Laboratories, Tokyo, Japan)
,
Oyake Takafumi
(Thermal Energy Engineering Laboratory, University of Tokyo, Tokyo, Japan)
,
Shiomi Junichiro
(Thermal Energy Engineering Laboratory, University of Tokyo, Tokyo, Japan)
,
Niemelae Janne-Petteri
(Department of Chemistry, Aalto University, Aalto, Finland)
,
Karppinen Maarit
(Department of Chemistry, Aalto University, Aalto, Finland)
,
Miyazaki Koji
(Department of Mechanical Engineering, Kyushu Institute of Technology, Kitakyushu, Japan)
,
Li Chaoyang
(School of Systems Engineering, Kochi University of Technology, Kochi, Japan)
,
Kawaharamura Toshiyuki
(School of Systems Engineering, Kochi University of Technology, Kochi, Japan)
,
Ichinose Ataru
(Central Research, Institute of Electric Power Industry (CRIEPI), Yokosuka, Japan)
,
Molina-Luna Leopoldo
(Department of Materials and Earth Sciences, Technische Universitaet Darmstadt, Darmstadt, Germany.)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
685
ページ:
180-185
発行年:
2019年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)