文献
J-GLOBAL ID:201902264503313745
整理番号:19A1918411
超薄分子ドーパント膜の自発パターン形成による遷移金属ジカルコゲナイド電界効果トランジスタの同調【JST・京大機械翻訳】
Tuning Transition-Metal Dichalcogenide Field-Effect Transistors by Spontaneous Pattern Formation of an Ultrathin Molecular Dopant Film
著者 (9件):
Ichimiya Hisashi
(Department of Physics and Electronics, Osaka Prefecture University, Japan)
,
Takinoue Masahiro
(Department of Computer Science, Tokyo Institute of Technology, Japan)
,
Fukui Akito
(Department of Physics and Electronics, Osaka Prefecture University, Japan)
,
Miura Kohei
(Department of Physics and Electronics, Osaka Prefecture University, Japan)
,
Yoshimura Takeshi
(Department of Physics and Electronics, Osaka Prefecture University, Japan)
,
Ashida Atsushi
(Department of Physics and Electronics, Osaka Prefecture University, Japan)
,
Fujimura Norifumi
(Department of Physics and Electronics, Osaka Prefecture University, Japan)
,
Kiriya Daisuke
(Department of Physics and Electronics, Osaka Prefecture University, Japan)
,
Kiriya Daisuke
(PRESTO, Japan Science and Technology Agency (JST), Japan)
資料名:
ACS Nano
(ACS Nano)
巻:
12
号:
10
ページ:
10123-10129
発行年:
2018年
JST資料番号:
W2326A
ISSN:
1936-0851
CODEN:
ANCAC3
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)