文献
J-GLOBAL ID:201902279013089857
整理番号:19A2343478
固定電位堆積法により作製したWO_3薄膜の光学特性と光電気触媒活性の改善【JST・京大機械翻訳】
Optical properties and photoelectrocatalytic activities improvement of WO3 thin film fabricated by fixed-potential deposition method
著者 (5件):
Kangkun Niphawan
(Department of Chemistry, Faculty of Science and Technology, Rajamangala University of Technology Thanyaburi, Pathum Thani, 12110, Thailand)
,
Kiama Nuanlaor
(Department of Chemistry, Faculty of Science and Technology, Rajamangala University of Technology Thanyaburi, Pathum Thani, 12110, Thailand)
,
Saito Nobuo
(Department of Materials Science and Technology, Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, 940-2188, Japan)
,
Ponchio Chatchai
(Department of Chemistry, Faculty of Science and Technology, Rajamangala University of Technology Thanyaburi, Pathum Thani, 12110, Thailand)
,
Ponchio Chatchai
(Advance Materials Design and Development (AMDD) Research Unit, Institute of Research and Development, Rajamangala University of Technology Thanyaburi, Klong 6, Thanyaburi, Pathum Thani, 12110 Thailand)
資料名:
Optik
(Optik)
巻:
198
ページ:
Null
発行年:
2019年
JST資料番号:
D0251A
ISSN:
0030-4026
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)