文献
J-GLOBAL ID:202002219628140537
整理番号:20A1235639
In(acac)3前駆体を用いた溶液プロセスにより形成されたIn2O3およびITO薄膜の電気特性
Electrical properties of In2O3 and ITO thin films formed by solution process using In(acac)3 precursors
著者 (4件):
Jain Puneet
(School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1211, Japan)
,
Nakabayashi Yuji
(Center for Nano Materials and Technology, Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1211, Japan)
,
Haga Ken-ichi
(School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1211, Japan)
,
Tokumitsu Eisuke
(School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1211, Japan)
資料名:
Japanese Journal of Applied Physics
(Japanese Journal of Applied Physics)
巻:
59
号:
SC
ページ:
SCCB12 (6pp)
発行年:
2020年02月
JST資料番号:
G0520B
ISSN:
0021-4922
CODEN:
JJAPB6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)