文献
J-GLOBAL ID:202002225642881971
整理番号:20A2773747
3Dナノ加工のための多光子励起深紫外線フォトリソグラフィー【JST・京大機械翻訳】
Multiphoton-Excited Deep-Ultraviolet Photolithography for 3D Nanofabrication
著者 (9件):
Taguchi Atsushi
(Department of Applied Physics, Osaka University, Osaka, Japan)
,
Nakayama Atsushi
(Department of Applied Physics, Osaka University, Osaka, Japan)
,
Nakayama Atsushi
(Advanced Photonics and Biosensing Open Innovation Laboratory, AIST-Osaka University, Osaka, Japan)
,
Oketani Ryosuke
(Department of Applied Physics, Osaka University, Osaka, Japan)
,
Kawata Satoshi
(Department of Applied Physics, Osaka University, Osaka, Japan)
,
Kawata Satoshi
(Serendip Research, Osaka, Japan)
,
Fujita Katsumasa
(Department of Applied Physics, Osaka University, Osaka, Japan)
,
Fujita Katsumasa
(Transdimensional Life Imaging Division, Institute for Open and Transdisciplinary Research Initiatives, Osaka University, Osaka, Japan)
,
Fujita Katsumasa
(Advanced Photonics and Biosensing Open Innovation Laboratory, AIST-Osaka University, Osaka, Japan)
資料名:
ACS Applied Nano Materials
(ACS Applied Nano Materials)
巻:
3
号:
11
ページ:
11434-11441
発行年:
2020年
JST資料番号:
W5033A
ISSN:
2574-0970
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)