文献
J-GLOBAL ID:202002239145746704
整理番号:20A0960445
カルコゲン化物ベース太陽電池応用のためのRFマグネトロンスパッタリングにより堆積した固有およびドープZnO薄膜の特性評価【JST・京大機械翻訳】
Characterization of Intrinsic and Doped ZnO Thin-Films Deposited by RF Magnetron Sputtering for Chalcogenide Based Solar Cell Applications
著者 (6件):
Gupta A. K.S.
(Chittagong University of Engineering and Technology,Department of Electrical and Electronic Engineering,Chattogram,Bangladesh)
,
Ahamed E.M.K.I.
(Chittagong University of Engineering and Technology,Department of Electrical and Electronic Engineering,Chattogram,Bangladesh)
,
Quamruzzaman M.
(Chittagong University of Engineering and Technology,Department of Electrical and Electronic Engineering,Chattogram,Bangladesh)
,
Matin M.A.
(Chittagong University of Engineering and Technology,Department of Electrical and Electronic Engineering,Chattogram,Bangladesh)
,
Rahaman K.S.
(Institute of Sustainable Energy, Universiti Tenaga Nasional (@The National Energy University), Jalan IKRAM-UNITEN,Kajang,Selangor,Malaysia,43000)
,
Amin N.
(Institute of Sustainable Energy, Universiti Tenaga Nasional (@The National Energy University), Jalan IKRAM-UNITEN,Kajang,Selangor,Malaysia,43000)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2019
号:
EICT
ページ:
1-4
発行年:
2019年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)