文献
J-GLOBAL ID:202002240417694154
整理番号:20A0495679
1.2kV 19A SiCパワーMOSFETの短絡劣化とその機構に関する研究【JST・京大機械翻訳】
Investigations on the Short-Circuit Degradation and its Mechanism of 1.2-KV 19-A SiC power MOSFETs
著者 (7件):
Wang J. L.
(South China University of Technology, Guangzhou,School of Electronic and Information Engineering,Guangdong,China,510000)
,
Chen Y. Q.
(Institute of the Ministry of Industry and Information Technology Guangzhou,Science and Technology on Reliability Physics and Application of Electronic Component Laboratory No.5 Electronics Research,Guangdong,China,510610)
,
He Z. Y.
(Institute of the Ministry of Industry and Information Technology Guangzhou,Science and Technology on Reliability Physics and Application of Electronic Component Laboratory No.5 Electronics Research,Guangdong,China,510610)
,
En Y. F.
(Institute of the Ministry of Industry and Information Technology Guangzhou,Science and Technology on Reliability Physics and Application of Electronic Component Laboratory No.5 Electronics Research,Guangdong,China,510610)
,
Xu X. B.
(South China University of Technology, Guangzhou,School of Electronic and Information Engineering,Guangdong,China,510000)
,
Huang Y.
(Institute of the Ministry of Industry and Information Technology Guangzhou,Science and Technology on Reliability Physics and Application of Electronic Component Laboratory No.5 Electronics Research,Guangdong,China,510610)
,
Geng K. W.
(South China University of Technology, Guangzhou,School of Electronic and Information Engineering,Guangdong,China,510000)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2019
号:
IPFA
ページ:
1-4
発行年:
2019年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)