文献
J-GLOBAL ID:202002240486538130
整理番号:20A0496250
高周波プラズマによる原子H不動態化によるBaSi_2の電気的性質の顕著な改善【JST・京大機械翻訳】
Significant improvement on electrical properties of BaSi2 due to atomic H passivation by radio-frequency plasma
著者 (6件):
Xu Zhihao
(University of Tsukuba,Institute of Applied physics, Graduate School of Pure and Applied Sciences,Tsukuba,Ibaraki,Japan,305-8573)
,
Gotoh Kazuhiro
(University of Tsukuba,Institute of Applied physics, Graduate School of Pure and Applied Sciences,Tsukuba,Ibaraki,Japan,305-8573)
,
Deng Tianguo
(University of Tsukuba,Institute of Applied physics, Graduate School of Pure and Applied Sciences,Tsukuba,Ibaraki,Japan,305-8573)
,
Toko Kaoru
(University of Tsukuba,Institute of Applied physics, Graduate School of Pure and Applied Sciences,Tsukuba,Ibaraki,Japan,305-8573)
,
Usami Noritaka
(University of Tsukuba,Institute of Applied physics, Graduate School of Pure and Applied Sciences,Tsukuba,Ibaraki,Japan,305-8573)
,
Suemasu Takashi
(University of Tsukuba,Institute of Applied physics, Graduate School of Pure and Applied Sciences,Tsukuba,Ibaraki,Japan,305-8573)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2019
号:
PVSC
ページ:
0012-0014
発行年:
2019年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)