文献
J-GLOBAL ID:202002247795343697
整理番号:20A0763591
Al_xCoCrFeNi高エントロピー合金膜の抵抗-温度挙動【JST・京大機械翻訳】
The resistivity-temperature behavior of Al x CoCrFeNi high-entropy alloy films
著者 (12件):
Wang Chenyu
(Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), Dalian University of Technology, Dalian 116024, China)
,
Li Xiaona
(Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), Dalian University of Technology, Dalian 116024, China)
,
Li Zhumin
(Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), Dalian University of Technology, Dalian 116024, China)
,
Wang Qing
(School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China)
,
Zheng Yuehong
(State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050, China)
,
Ma Yue
(School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China)
,
Bi Linxia
(Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), Dalian University of Technology, Dalian 116024, China)
,
Zhang Yuanyuan
(School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China)
,
Yuan Xihui
(School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China)
,
Zhang Xin
(School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China)
,
Dong Chuang
(Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), Dalian University of Technology, Dalian 116024, China)
,
Liaw Peter K.
(Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USA)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
700
ページ:
Null
発行年:
2020年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)