文献
J-GLOBAL ID:202002268122888895
整理番号:20A2365669
酸素分圧制御による室温で成長させたFe_2O_3ドープNiOエピタキシャル薄膜の結晶構造の修正【JST・京大機械翻訳】
Modifying the crystal structures of Fe2O3-doped NiO epitaxial thin films grown at room temperature by controlling the oxygen partial pressure
著者 (18件):
Seo Okkyun
(Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), Kouto, Sayo, Hyogo 679-5148, Japan)
,
Seo Okkyun
(Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan)
,
Tayal Akhil
(Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan)
,
Kim Jaemyung
(Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), Kouto, Sayo, Hyogo 679-5148, Japan)
,
Kim Jaemyung
(Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan)
,
Song Chulho
(Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan)
,
Katsuya Yoshio
(Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan)
,
Sakata Osami
(Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), Kouto, Sayo, Hyogo 679-5148, Japan)
,
Sakata Osami
(Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan)
,
Sakata Osami
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan)
,
Sakata Osami
(Center for Synchrotron Radiation Research, Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Koto, Sayo, Hyogo 679-5198, Japan)
,
Tang Jiayi
(Graduate School of Engineering, University of Hyogo, 2167, Shosha, Himeji, Hyogo 671-2280, Japan)
,
Lee Nodo
(Materials & Devices Advanced Research Institute, LG Electronics, 10, Magokjungang-ro, Gangseo-gu, Seoul 07796, Republic of Korea)
,
Kim Yong Tae
(Department of Chemical Engineering & Biotechnology, Korea Polytechnic University, 237 Sangidaehak-ro, Siheung-si, Republic of Korea)
,
Ikeya Yuki
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan)
,
Takano Shiori
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan)
,
Matsuda Akifumi
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan)
,
Yoshimoto Mamoru
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
533
ページ:
Null
発行年:
2020年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)