文献
J-GLOBAL ID:202002272677693200
整理番号:20A0916304
集束ヘリウムイオンビーム製造プロセスにより作製した3Dナノスケールカイラルヘリックス【JST・京大機械翻訳】
3D Nanoscale Chiral Helixes Fabricated by Focused Helium Ion Beam Manufacturing Process
著者 (8件):
Jin Shengxiao
(National Key Laboratory of Micro/Nano Fabrication Technology, Institute of Microelectronics, Peking University,Beijing,P. R. CHINA,100871)
,
Chen Zhuojie
(National Key Laboratory of Micro/Nano Fabrication Technology, Institute of Microelectronics, Peking University,Beijing,P. R. CHINA,100871)
,
Chen Xiaoyu
(National Key Laboratory of Micro/Nano Fabrication Technology, Institute of Microelectronics, Peking University,Beijing,P. R. CHINA,100871)
,
Zhu Rui
(Electron Microscopy Laboratory, Peking University,Beijing,P. R. China,100871)
,
Zhu Jia
(National Key Laboratory of Micro/Nano Fabrication Technology, Institute of Microelectronics, Peking University,Beijing,P. R. CHINA,100871)
,
Huang Yun
(National Key Laboratory of Micro/Nano Fabrication Technology, Institute of Microelectronics, Peking University,Beijing,P. R. CHINA,100871)
,
Xu Jun
(Electron Microscopy Laboratory, Peking University,Beijing,P. R. China,100871)
,
Wu Wengang
(National Key Laboratory of Micro/Nano Fabrication Technology, Institute of Microelectronics, Peking University,Beijing,P. R. CHINA,100871)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2020
号:
MEMS
ページ:
897-900
発行年:
2020年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)