文献
J-GLOBAL ID:202002280410647488
整理番号:20A0148736
積層電極を用いた金属/GeO_2/n-Ge構造における電流密度の増加【JST・京大機械翻訳】
Increase in Current Density at Metal/GeO2/n-Ge Structure by Using Laminated Electrode
著者 (6件):
Tsukamoto Takahiro
(The University of Electro-Communications, Chofu, Tokyo, Japan)
,
Kurihara Shota
(Tokyo University of Agriculture and Technology, Koganei, Tokyo, Japan)
,
Hirose Nobumitsu
(National Institute of Information and Communications Technology, Koganei, Tokyo, Japan)
,
Kasamatsu Akifumi
(National Institute of Information and Communications Technology, Koganei, Tokyo, Japan)
,
Matsui Toshiaki
(National Institute of Information and Communications Technology, Koganei, Tokyo, Japan)
,
Suda Yoshiyuki
(Tokyo University of Agriculture and Technology, Koganei, Tokyo, Japan)
資料名:
Electronic Materials Letters
(Electronic Materials Letters)
巻:
16
号:
1
ページ:
41-46
発行年:
2020年
JST資料番号:
W4309A
ISSN:
1738-8090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)