文献
J-GLOBAL ID:202102276355301441
整理番号:21A0183429
超伝導体Kドープ[数式:原文を参照]のエピタキシャル薄膜の実現【JST・京大機械翻訳】
Realization of epitaxial thin films of the superconductor K-doped [Formula : see text]
著者 (11件):
Qin Dongyi
(Department of Applied Physics, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan)
,
Iida Kazumasa
(Department of Materials Physics, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan)
,
Hatano Takafumi
(Department of Materials Physics, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan)
,
Saito Hikaru
(Institute for Materials Chemistry and Engineering, Kyushu University, Kasuga, Fukuoka 816-8580, Japan)
,
Saito Hikaru
(Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan)
,
Ma Yiming
(Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan)
,
Wang Chao
(The Ultramicroscopy Research Center, Kyushu University, Nishi-ku, Fukuoka 819-0395, Japan)
,
Hata Satoshi
(Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan)
,
Hata Satoshi
(The Ultramicroscopy Research Center, Kyushu University, Nishi-ku, Fukuoka 819-0395, Japan)
,
Naito Michio
(Department of Applied Physics, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan)
,
Yamamoto Akiyasu
(Department of Applied Physics, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan)
資料名:
Physical Review Materials
(Physical Review Materials)
巻:
5
号:
1
ページ:
014801
発行年:
2021年
JST資料番号:
W3690A
ISSN:
2475-9953
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)