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J-GLOBAL ID：200901011559222739   Update date: Sep. 03, 2024

Naoi Yoshiki

ナオイ ヨシキ | Naoi Yoshiki
Affiliation and department：
The University of Tokushima Institute of Technology and Science

About The University of Tokushima Institute of Technology and Science


Job title： Associate Professor
Research field  (3)： Optical engineering and photonics ,  Electric/electronic material engineering ,  Nano/micro-systems
Research keywords  (5)： 光制御 ,  微小光学 ,  ナノ光デバイス ,  発光ダイオード ,  窒化物半導体
Research theme for competitive and other funds  (11)：
  • 2018 - 2021 Development of high performance LED with subwavelength nano structure
  • 2017 - 2020 Non-thermal anealing of the interface between wide band-gap semiconductor and metal induced by femtosecond laser irradiation
  • 2014 - 2017 Development of three-dimensional micro processing techniques using near-infrared femtosecond laser
  • 2012 - 2015 High performance light emitting diode by subwavelength grating
  • 2011 - 2012 Development of new microprocessing technology of silicon crystalline substrate: internal, three-dimensional, arbitrary-shape removal processing
Show all
Papers (108)：
  • Yuusuke Takashima, Kentaro Nagamatsu, Masanobu Haraguchi, Yoshiki Naoi. Dynamic wide gamut color generation using highly lossy metal-based metal-dielectric-metal structure. Applied Physics Express. 2024. 17. 7. 072005-072005
  • Yuusuke Takashima, Shunsuke Furuta, Kentaro Nagamatsu, Masanobu Haraguchi, Yoshiki Naoi. Broadband Ag/SiO2/Fe/TiO2 ultrathin planar absorber with a wide acceptance angle from visible to near-infrared regions. Optical Materials Express. 2024. 14. 3. 778-778
  • Kentaro Nagamatsu, Takumi Miyagawa, Atsushi Tomita, Hideki Hirayama, Yuusuke Takashima, Yoshiki Naoi. High growth temperature for AlN by jet stream gas flow metalorganic vapor phase epitaxy. Scientific Reports. 2023. 13. 1
  • Atsushi Tomita, Takumi Miyagawa, Hideki Hirayama, Yuusuke Takashima, Yoshiki Naoi, Kentaro Nagamatsu. Investigation of V/III ratio dependencies for optimizing AlN growth during reduced parasitic reaction in metalorganic vapor phase epitaxy. Scientific Reports. 2023. 13. 1
  • Kentaro Nagamatsu, Shota Tsuda, Takumi Miyagawa, Reiya Aono, Hideki Hirayama, Yuusuke Takashima, Yoshiki Naoi. Reduction of parasitic reaction in high-temperature AlN growth by jet stream gas flow metal-organic vapor phase epitaxy. Scientific Reports. 2022. 12. 1
ｍore...
MISC (4)：
Lectures and oral presentations  (201)：
  • Significant enhancement of magneto-optical effect at ultraviolet wavelength using Nisubwavelength grating on SiO2/Ni structure
    (30th International Symposium on Imaging, Sensing, and Optical Memory (ISOM'20) 2020)
  • 構造高さを変調したTiO2メタ表面による集光紫外発光ダイオードの提案
    (日本光学会年次学術講演会Optics & Photonics Japan 2020 2020)
  • 高屈折率差周期ブリッジ構造による可視光フィルター
    (第81回応用物理学会秋季学術講演会 2020)
  • Ni/SiC界面へのフェムト秒レーザ照射による熱アニールを用いないオーミック電極形成
    (第81回応用物理学会秋季学術講演会 2020)
  • Magnetically tunable visible reflectivity utilizing the electron accumulation in indium-tin-oxide waveguide layer with subwavelength grating
    (SPIE Optics + Photonics 2020 DIgital Forum 2020)
ｍore...
Education (3)：
  • 1990 - 1993 Tohoku University Graduate School of Engineering
  • 1988 - 1990 Tokushima University Graduate School of Engineering
  • 1984 - 1988 The University of Tokushima Faculty of Engineering
Professional career (1)：
  • (BLANK)
Work history (2)：
  • 2019/03 - 現在 The University of Tokushima
  • 2017/04 - 現在 The University of Tokushima
Committee career (4)：
  • 2017/06 - 2019/05 電子情報通信学会 会誌編集委員会委員
  • 2013/04 - 2014/03 電子情報通信学会 代議員
  • 2006/02 - 2010/01 応用物理学会 代議員
  • 2004/04 - 2006/03 応用物理学会 教育・公益事業委員会委員
Awards (2)：
  • 2019/03 - 応用物理学会 応用物理学会2019年春季学術講演会Poster Award
  • 2004/01 - 財団法人三木康楽会 三木康楽会賞
Association Membership(s) (6)：
IEEE ,  SPIE ,  日本光学会 ,  Optica ,  電子情報通信学会 ,  応用物理学会
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