Research field (6):
Electric/electronic material engineering
, Electronic devices and equipment
, Thin-film surfaces and interfaces
, Composite materials and interfaces
, Applied plasma science
, Basic plasma science
Research theme for competitive and other funds (12):
2021 - 2024 Precise structure control of nano-composite films in low-temperature plasma reaction field with fast flow
2021 - 2023 Development of a plasma bonding process by reaction control of plasma-liquid interface
2020 - 2022 次世代高容量Liイオン電池実現に向けた新規ナノ複合材料の創製
2017 - 2020 Control of the reactive species production in liquid by using the plasma-jet turbulence flow and the selective killing of cancer stem cells by plasma activated liquid
2014 - 2019 Precise control of nanoparticle deposition using plasma
2014 - 2017 Development of deposition technology of surface nano-structure-controlled ZnO thin films using atmospheric pressure non-equilibrium plasma
2012 - 2017 Creation of kinetics and establishment of safety medical science on plasma nano material
2014 - 2017 Development of Ge nanoparticle film by using inflight plasma process for Li ion butteries
2012 - 2017 Development of novel plasma sources for plasma medicine through advanced spatio-temporal control of atmospheric-pressure discharge
2014 - 2016 Development of novel atomic-layer-deposition plasma PVD processes for efficient and high-rate reactive film-formation processes
2012 - 2014 Transportation of dust particles by solitary-wave electric field in plasma
2009 - 2014 Bond Engineering at Nano-Interfaces using Nanoparticle Plasmas
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Papers (191):
Amorphous Ge/LiAlGePO composite anodes with a multistacking structure developed via co-sputtering for high-capacity Li+-ion batteries. Advanced Materials Technologies. 2025. accepted
Shin Kanejita, Giichiro Uchida, Hiromasa Tanaka, Kiho Tabata, Yuta Yamamoto, Noriyasu Ohno. Nanoporous Helium-Silicon Co-Deposition Thin Film via Plasma-Assisted Process for Lithium-Ion-Battery Anodes. Advanced Energy and Sustainability Research. 2025. 6. 2400300
Xiaozhng Chen, Yuta Nishina, Giichiro Uchida, Tomohiro Nozaki. Plasma-catalyzed sustainable nanostructured carbon synthesis: Advancing chemical-looping CO2 fixation. ACS Energy Letter. 2024. 9. 6072-6080
Kosuke Takenaka, Soutaro Nakamoto, Ryosuke Koyari, Akiya Jinda, Susumu Toko, Giichiro Uchida, Yuichi Setsuhara. Influence of pre-treatment with non-thermal atmospheric pressure plasma on bond strength of TP340 titanium-PEEK direct bonding. The International Journal of Advanced Manufacturing Technology. 2024. 134. 1637-1644
Tomoki Omae, Teruya Yamada, Daiki Fujikake, Takahiro Kozawa, Giichiro Uchida. Development of nanostructured Ge/C anodes with a multistacking layer fabricated via Ar high-pressure sputtering for high-capacity Li+-ion batteries. Applied Physics Express. 2024. 17. 026001
竹中弘祐, 中本壮太郎, 小鑓亮輔, 都甲将, 内田儀一郎, 節原裕一. Development of organic material-metal dissimilar material bonding technology using atmospheric pressure non-equilibrium plasma jet. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
竹中弘祐, 中本壮太郎, 小鑓亮輔, 都甲将, 内田儀一郎, 節原裕一. Effect of Atmospheric Pressure Non-equilibrium RF Plasma Jet Irradiation on Direct Bonding of Metal-Organic Dissimilar Materials. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
竹中弘祐, 吉谷友希, 都甲将, 内田儀一郎, 江部明憲, 節原裕一. Development of Plasma-Assisted Reactive Processes for Large-Area Uniform Formation of High-Mobility IGZO Thin Film Transistors. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2022. 69th
竹中弘祐, 内田儀一郎, 江部明憲, 節原裕一. Amorphous InGaZnOx thin film formation by a plasma-assisted reactive process. 応用物理. 2021. 90. 1
竹中弘祐, 林祐仁, 小松響, 都甲将, 内田儀一郎, 江部明憲, 節原裕一. Low-temperature Formation of High-Mobility IGZO Thin Film Transistors using Reactive Plasma Processes (IV). 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd