Surface electronic states and electrostatic attractive forces between metals or semiconductor and tribocharged polymer. Mater. Res. Soc. Symp. Proc. 2005. 872. J21.1.1-J21.1.6
Photoelectron emission technique for the surface analysis of silicon wafer covered with oxide film. Mater. Res. Soc. Symp. Proc. 2005. 864. E9.34.1-E9.43.6
Surface electronic states and electrostatic attractive forces between metals or semiconductor and tribocharged polymer. Mater. Res. Soc. Symp. Proc. 2005. 872. J21.1.1-J21.1.6
Temperature-programmed photoelectron emission analysis of copper surfaces subjected to cleaning and abrasion in organic liquids
2nd International Conference on Processing Materials for Properties, TMS (San Francisco, California) 2000
Temperature-programmed photoelectron emission analysis of copper surfaces subjected to cleaning and abrasion in organic liquids
2nd International Conference on Processing Materials for Properties, TMS (San Francisco, California) 2000