Research field (4):
Manufacturing and production engineering
, Chemical reaction and process system engineering
, Electric/electronic material engineering
, Thin-film surfaces and interfaces
Research keywords (4):
半導体材料プロセス
, プラズマプロセス
, ナノ炭素材料
, 表面分析
Research theme for competitive and other funds (15):
2024 - 2027 Research on corrosion inhibition of fuel cladding tubes using two-dimensional materials for severe accident avoidance
2023 - 2027 層間挿入によるh-BNの半導体化とベータボルタ電池応用
2023 - 2026 Catalytic application of mechanochemical effects by controlling material strain
2023 - 2024 SiCパワーMOSFETの高効率化に向けたゲート絶縁膜形成プロセスの検証
2018 - 2024 Silicene surrounded by oxide -quality improvement and its application to transistors
2012 - 2014 Surface treatment process using photoemission-assisted plasma for achievement of atomic scale flattened surface
2011 - 2012 黒鉛の光核反応を用いた高品質ホウ素ドープグラフェン作製プロセスの研究
2007 - 2008 歪み誘起熱酸化プロセスを用いたシリコン極薄酸化膜形成機構の解明
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Papers (83):
Takami Tomohide, Nishiyama Hokuto, Watanabe Yu, Omi Haruna, Ohta Mizuki, Ono Manami, Watabe Minami, Miyashita Kazuho, Mitsui Taiga, Yoneda Rio, et al. Development of Multi-Functional Submicropipettes for Exploring Biomaterials. 工学院大学研究論叢. 2024. 61. 1. 19-30
Shuichi Ogawa. Evaluation of Electronic/Chemical State of Nano Carbon Materials Using Photoelectron Spectroscopy. Journal of Surface Analysis. 2023. 29. 2. 82-89
Tomohide Takami, Chie Ohtomo, Naoki Kaneko, Kyo Shibuya, Kazuho Miyashita, Mizuki Ohta, Rio Yoneda, Mamiko Ozawa, Hideyuki Magara, Shuichi Ogawa, et al. Argon Gas Flow Through Micro- and Nano-pipettes. e-Journal of Surface Science and Nanotechnology. 2023. 21. 4. 257-261
Hisato Yamaguchi, Ryunosuke Yusa, Gaoxue Wang, Michael T. Pettes, Fangze Liu, Yasutaka Tsuda, Akitaka Yoshigoe, Tadashi Abukawa, Nathan A. Moody, Shuichi Ogawa. Work function lowering of LaB6 by monolayer hexagonal boron nitride coating for improved photo- and thermionic-cathodes. Applied Physics Letters. 2023. 122. 14. 141901/1-7
Yasutaka Tsuda, Akitaka Yoshigoe, Shuichi Ogawa, Tetsuya Sakamoto, Yoshiki Yamamoto, Yukio Yamamoto, Yuji Takakuwa. Roles of excess minority carrier recombination and chemisorbed O2 species at SiO2/Si interfaces in Si dry oxidation: Comparison between p-Si(001) and n-Si(001) surfaces. The Journal of Chemical Physics. 2022. 157. 23. 234705/1-21
Observation of Chemisorbed O2 Molecule at SiO2/Si(001) Interface During Si Dry Oxidation
(Annual Meeting of the Japan Society of Vacuum and Surface Science 2024 2024)
Wet-chemical functionalization of graphene toward Fermi level and carrier density tuning
(The 10th International Symposium on Surface Science 2024)
Comparison of Single-step Oxidation Loop A and Double-step Oxidation Loop B between p-Si(001) and n-Si(001) surfaces
(The 10th International Symposium on Surface Science 2024)
2017/03 - 2018/10 The 14th Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures Local committee
2016/04 - 2018/03 日本表面科学会 広報・会員増強・市民講座委員会 委員
2011/04 - 2016/03 日本表面科学会 広報・市民講座委員会 委員
2013/04 - 2015/03 日本表面科学会 東北・北海道支部 庶務幹事
2011/01 - 2015/01 日本表面科学会 講演奨励賞選定委員会 委員
2011/01 - 2015/01 日本表面科学会 学術講演会委員会 委員
2012/10 - 2013/11 6th International Symposium on Practical Surface Analysis steering committee
2011/04 - 2013/03 日本表面科学会 東北・北海道支部 庶務・会計幹事
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Awards (12):
2025/05 - 公益社団法人日本表面真空学会 2024年度日本表面真空学会論文賞 Observation of Chemisorbed O<sub>2</sub> Molecule at SiO<sub>2</sub>/Si(001) Interface During Si Dry Oxidation
2015/07 - 13th International Symposium on Sputtering and Plasma Processes ISSP2015 Best Poster Award Ion incident energy dependence for Cu surface smoothing using Ar+ ions generated by photoemission-assisted plasma
2014/09 - International Conference on Diamond and Carbon Materials Poster Award Decrease mechanism of the resistivity of networked nano- graphite grown by photoemission -assisted plasma -enhanced CVD using CH<sub>4</sub>/Ar and CH<sub>4</sub>/H<sub>2</sub>
2007/09/04 - 社団法人応用物理学会 第29回応用物理学会論文賞(JJAP論文奨励賞) Rate-Limiting Reactions of Growth and Decomposition Kinetics of Very Thin Oxides on Si(001) Surfaces Studied by Reflection High-Energy Electron Diffraction Combined with Auger Electron Spectroscopy
2006/11/10 - 2006 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES: SCIENCE AND TECHNOLOGY IWDTF Young Researcher Award Layer-by-Layer Oxidation on Si(001) Surface Studied by Real-Time Photoelectron Spectroscopy Using Synchrotron Radiation