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J-GLOBAL ID:201801000642440029   Update date: Aug. 09, 2024

Yoshigoe Akitaka

ヨシゴエ アキタカ | Yoshigoe Akitaka
Affiliation and department:
Research field  (6): Composite materials and interfaces ,  Electric/electronic material engineering ,  Quantum beam science ,  Nanomaterials ,  Thin-film surfaces and interfaces ,  Thin-film surfaces and interfaces
Research keywords  (5): surface science ,  Physical Chemistry ,  material processes ,  synchrotron radiation ,  Applied Physics
Research theme for competitive and other funds  (11):
  • 2024 - 2027 シビアアクシデント回避に向けた二次元材料を活用した燃料被覆管の腐食抑制の研究
  • 2023 - 2026 Development of stable intermediates for handling by hydrogenation of monolayer germanene
  • 2020 - 2023 Understanding and control of silicon surface oxidation by supersonic molecular beams and synchrotron radiation real-time photoelectron spectroscopy
  • 2016 - 2018 構造材料の耐環境設計技術向上に向けた放射光表面分析技術の適用検討
  • 2014 - 2017 Precise controls and fundamental understandings of oxidation reactions to for ultrathin oxides at Ge surfaces for future nano-devices
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Papers (208):
  • Koki Hayashida, Yasutaka Tsuda, Natsumi Murase, Takashi Yamada, Akitaka Yoshigoe, Wilson Agerico Diño, Michio Okada. Dissociative adsorption of supersonic CH3Cl on Cu oxide Surfaces: Cu2O(111) and bulk Cu2O precursor “29”-Structure on Cu(111). Applied Surface Science. 2024. 669
  • Takuhiro Kakiuchi, Ryota Anai, Taiju Saiki, Yasutaka Tsuda, Akitaka Yoshigoe. Coverage Dependence upon Early Oxidation Stages of Hafnium-Adsorbed Si(111)-7 × 7. The Journal of Physical Chemistry C. 2024
  • Takuma Kobayashi, Asato Suzuki, Takato Nakanuma, Mitsuru Sometani, Mitsuo Okamoto, Akitaka Yoshigoe, Takayoshi Shimura, Heiji Watanabe. Characterization of nitrided SiC(1 1 ̅ 00) MOS structures by means of electrical measurements and X-ray photoelectron spectroscopy. Materials Science in Semiconductor Processing. 2024. 175. 108251-108251
  • Takamasa Makino, Yasutaka Tsuda, Akitaka Yoshigoe, Wilson Agerico Diño, Michio Okada. CH3Cl Dissociation, CH3 abstraction, and Cl adsorption from the dissociative scattering of supersonic CH3Cl on Cu(111) and Cu(410). Applied Surface Science. 2024. 642. 158568-158568
  • Kentaro Onishi, Takuma Kobayashi, Hidetoshi Mizobata, Mikito Nozaki, Akitaka YOSHIGOE, Takayoshi Shimura, Heiji WATANABE. Formation of high-quality SiO2/GaN interfaces with suppressed Ga-oxide interlayer via sputter deposition of SiO2. Japanese Journal of Applied Physics. 2023. 62. 5. 050903
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MISC (596):
  • 棟安陸, 室山瑞穂, 小早川なの, 津田泰孝, 坂本徹哉, 渡部誠也, 山田剛司, 赤井恵, 岡田美智雄, 吉越章隆, et al. Reaction and ionization of functional groups at the end of alkanethiolate self-assembled monolayers. 分子科学討論会講演プログラム&要旨(Web). 2022. 16th
  • 小川修一, 山田貴壽, 津田泰孝, 吉越章隆, 虻川匡司. ガスバリア特性評価のためのグラフェン用触媒金属膜の検討. 日本表面真空学会東北・北海道支部学術講演会講演予稿集. 2021. 2020 (CD-ROM)
  • 津田泰孝, 坂本徹哉, 吉越章隆. Study on oxidation on Ge(110) surface by using synchrotron radiation photoemission spectroscopy. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2021. 68th
  • 角谷正友, 津田泰孝, 坂本徹哉, 隅田真人, SANG Liwen, 原田善之, 冨永亜希, 吉越章隆. Dynamic observation of oxidation on GaN surface by real-time XPS under irradiating oxidation gas. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd
  • 津田泰孝, 小川修一, 吉越章隆, 坂本徹哉, 高桑雄二. Effect of O2 and SR ON-OFF on band bending at SiO2/Si(001) interfaces. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd
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Patents (1):
  • グラフェンの形成方法及びグラフェンの形成装置
Books (2):
  • 放射光利用の手引き : 農水産・医療、エネルギー、環境、材料開発分野などへの応用
    アグネ技術センター 2019 ISBN:9784901496957
  • X線光電子分光法
    講談社 2018 ISBN:9784065140475
Lectures and oral presentations  (64):
  • AlGaN/GaNヘテロ構造の低バイアス電力ICPエッチングによる低損傷加工
    (2019)
  • Evaluation of Reactive Ion Etching-induced Damage on 2DEG at AlGaN/GaN Interface
    (2019)
  • Titanium dioxide surface adsorbed water characterized by soft X-ray photoemission spectroscopy
    (Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science 2019)
  • Initial oxidation process of ultrathin hafnium film on Si(111) surface studied by Hf 4f, Si 2p, and O 1s core-level spectroscopy
    (Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science 2019)
  • Synchrotron-Radiation X-ray Photoelectron Spectroscopy Study of GaOx Interlayer Growth on GaN Substrate with Different Conduction Type
    (2019)
more...
Education (1):
  • 1993 - 1996 The Graduate University for Advanced Studies
Professional career (1):
  • 博士(理学) (総合研究大学院大学)
Work history (1):
  • 2020/04 - 現在 Osaka University
Committee career (8):
  • 2021/04 - 現在 日本表面真空学会 関西支部役員
  • 2018/04 - 現在 応用物理学会 薄膜・表面物理分科会 幹事
  • 2017/05 - 現在 応用物理学会 プログラム編成委員
  • 2011/12 - 現在 日本分光学会 関西支部 幹事
  • 2019/10 - 2021/09 日本放射光学会 編集委員
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Awards (3):
  • 2016/09 - 日本学術振興会 平成28年度「科研費」審査委員の表彰状「有意義な審査意見を付していただいた審査委員」
  • 2015 - 2015 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES - SCIENCE AND TECHNOLOGY- IWDTF Young Paper Award Rapid Temperature Oxidation at SiO2/Si(001) Interface Studied by Real-time X-ray photoelectron spectroscopy: Rapid Cooling Versus Rapid Heating
  • 2012/06 - 28th Symposium on Chemical Kinetics and Dynamics Best Poster Prize Enhancement of surface oxidation on Ge(111)-c(2×8) caused by supersonic O2 Beam
Association Membership(s) (4):
THE SPECTROSCOPICAL SOCIETY OF JAPAN ,  THE JAPANESE SOCIETY FOR SYNCHROTRON RADIATION RESEARCH ,  THE JAPAN SOCIETY OF VACUUM and SURFACE SCIENCE ,  The Japan Society of Applied Physics
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