Rchr
J-GLOBAL ID:201801002021861090
Update date: Jun. 06, 2024
TABEI TETSUO
TABEI TETSUO
Affiliation and department:
Papers (17):
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Matsuo, Naoto, Heya, Akira, Yamana, Kazushige, Sumitomo, Koji, Tabei, Tetsuo. Influence of the Gate Voltage or the Base Pair Ratio Modulation on the A-DNA FET Performance. IEICE TRANSACTIONS ON ELECTRONICS. 2024. E107C. 3. 76-79
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Aprilia, Lia, Meguro, Tatsuya, Nuryadi, Ratno, Tabei, Tetsuo, Mimura, Hidenori, Kuroki, Shin-Ichiro. Integrated Fabrication Process of Si Microcantilever Using TMAH Solution With Planar Mask. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS. 2023. 32. 3. 290-296
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Matsuo, Naoto, Yoshida, Kazuki, Sumitomo, Koji, Yamana, Kazushige, Tabei, Tetsuo. Ambipolar Conduction of lambda-DNA Transistor Fabricated on SiO2/Si Structure. IEICE TRANSACTIONS ON ELECTRONICS. 2022. E105C. 8. 369-374
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吉田一輝, 松尾直人, 山名一成, 住友弘二, 部家彰, 原田哲男, 田部井哲夫. 軟X線照射によるDNAの放射線損傷の解析. 電子情報通信学会論文誌. 2022. J105-C. 2. 74-77
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Ono, Tatsuyoshi, Hirata, Satoshi, Amemiya, Yoshiteru, Tabei, Tetsuo, Yokoyama, Shin. Long annealing effect on spin Seebeck devices fabricated using CexY3-xFe5O12 deposited by metal-organic decomposition. JAPANESE JOURNAL OF APPLIED PHYSICS. 2018. 57. 4
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