Research field (4):
Inorganic materials
, Applied physics - general
, Electric/electronic material engineering
, Electronic devices and equipment
Research keywords (4):
SiスピンMOSFET
, Heusler
, Si spin
, Spintronics
Research theme for competitive and other funds (5):
2024 - 2027 Development of Low Interfacial Roughness Structures to Realize High Performance in Silicon Spin Field Effect Transistors
2024 - 2025 Clarification of Spin Conduction Mechanisms in Semiconductors through High Sensitivity and High Resolution Spin Signal Measurement
2021 - 2024 SiスピンMOSFETの実現を可能とする低界面抵抗構造の創製
2023 - 2024 放射線下で動作する電子部品SiスピンMOSFETの試作開発
2019 - 2021 Development of highly efficient Si spin-MOSFETs by interface-controlled techniques
Papers (70):
M. Ishikawa, Y. Saito, K. Hamaya. Study of spin transport and magnetoresistance effect in silicon-based lateral spin devices for spin-mosfet applications. Journal of the Magnetics Society of Japan. 2020. 44. 3. 56-63
Research rerated to spin relaxation mechanism and high efficiency spin injection/detection for Si spintronics devices. 大阪大学大学院基礎工学研究科システム創成専攻 博士課程学位論文. 2019
A. Tiwari, H. Yoda, Y. Kato, K. Koi, M. Ishikawa, S. Oikawa, Y. Saito, T. Inokuchi, N. Shimomura, M. Shimizu, et al. Reliable Estimation of TaB Spin Hall Angle by Incorporating the Interfacial Transparency and Isolating Inverse Spin Hall Effect in ST-FMR Analysis. IEEE International magnetic conference 2018 (Intermag 2018). 2018. ED-07