- 2022 - 2025 Understanding carrier transport properties of ultra-thin semiconductor channel CMOS and establishing a method to enhance channel mobility
- 2017 - 2022 Precise structure control of 3-dimensional integration CMOS using high mobility materials through layer transfer
- 2016 - 2019 スティープスロープMOSトランジスタに最適なMOSゲートスタック構造に関する研究
- 2017 - 2018 3次元集積Ge/III-V CMOSに向けた素子技術基盤の構築
- 2014 - 2017 Understanding of carrier transport properties of Ge-On-Insulator CMOS and establishment of performance enhancement engineering
- 2012 - 2015 高移動度チャネルMOSFETのキャリア輸送と素子構造に関する理論的研究
- 2011 - 2014 Understanding of carrier transport mechanism in Ge MOS interfaces and establishment of mobility enhancement technologies
- 2010 - 2013 Design of Electronic Properties and Development of High-Mobility Channel Technology for Low Power/High-Speed Nano-CMOS Devices
- 2008 - 2010 Understanding of mechanisms dominating inversion-layer mobility in strained-Si MOSFETs and establishment of guideline for the mobility enhancement
- 2006 - 2010 Technology Evolution for Silicon Nano-Electronics
- 2006 - 2009 Nano-structure functional devices based Ge-based channels
- 2006 - 2007 Si系新チャネル材料MOSトランジスタにおけるキャリア輸送特性の研究
- 2004 - 2006 Study on physical models for understanding the properties of strained-Si MOS Transistors
- 2005 - 2005 シリコンナノエレクトロニクスの新展開-ポストスケーリングテクノロジー
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