Rchr
J-GLOBAL ID：202201010001463507
Update date: Aug. 05, 2024
Piedra Lorenzana Jose Alberto
Piedra Lorenzana Jose Alberto
Research field (1)：
Electric/electronic material engineering
Research keywords (5)：
Photonics devices
, Crystal growth
, Si
, Ge
, GaP
Research theme for competitive and other funds (1)：
- 2023 - 2025 Novel group-IV nitride films by reactive sputtering as potential nonlinear optical materials in Si photonics
Papers (12)：
-
Joshua Chombo, Mohd Faiz Bin Amin, Jose A. Piedra-Lorenzana, Takeshi Hizawa, Keisuke Yamane, Mingjun Jiang, Donghwan Ahn, Kazumi Wada, Yasuhiko Ishikawa. Anti-relaxation of tensile lattice strain in Si-embedded Ge strip structure for photonic device applications. Japanese Journal of Applied Physics. 2024. 63. 3
-
Takumi Maeda, Kota Kato, Jose A. Piedra-Lorenzana, Takeshi Hizawa, Tetsuya Nakai, Yasuhiko Ishikawa. Trench-filling heteroepitaxy of [100]-oriented germanium arrays on (001) silicon substrate. Japanese Journal of Applied Physics. 2024. 63. 3
-
Shohei Kaneko, Jose A. Piedra-Lorenzana, Keisuke Yamane, Junichi Fujikata, Yasuhiko Ishikawa. Franz-Keldysh Effect in Lateral pin Photodetectors of Ge Strip on Si at C-, L- and U-Band Wavelengths. IEEE International Conference on Group IV Photonics GFP. 2024
-
Mohd Faiz Bin Amin, Jose A. Piedra-Lorenzana, Keisuke Yamane, Takeshi Hizawa, Tetsuya Nakai, Yasuhiko Ishikawa. High-quality Ge epitaxial film based on dislocation trapping mechanism in patterned Si substrate. Japanese Journal of Applied Physics. 2023
-
Kota Kato, Kazuki Motomura, Jose A. Piedra-Lorenzana, Mohd Faiz Bin Amin, Takeshi Hizawa, Tetsuya Nakai, Yasuhiko Ishikawa. Trench-Filling Epitaxy of Germanium on (001) Silicon Enhanced Using [100]-Oriented Patterns. Journal of Electronic Materials. 2023
ｍore...
MISC (13)：
-
CHOMBO Joshua, AMIN Mohd Faiz Bin, HIZAWA Takeshi, PIEDRA-LORENZANA Jose A., JIANG Mingjun, AHN Donghwan, WADA Kazumi, ISHIKAWA Yasuhiko. Tensile lattice strain in embedded wire structures of Ge grown on Si substrate. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
-
AMIN Mohd Faiz Bin, PIEDRA-LORENZANA Jose A., YAMENE Keisuke, HIZAWA Takeshi, NAKAI Tetsuya, ISHIKAWA Yasuhiko. Ge epitaxial layer grown on V-groove patterned Si substrate. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
-
PIEDRA-LORENZANA Jose A., KANEKO Shohei, FUKUSHIMA Takaaki, YAMANE Keisuke, FUJIKATA Junichi, ISHIKAWA Yasuhiko. AlN Stressor Layer for Ge-on-Si Photonic Devices. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
-
PIEDRA-LORENZANA Jose A., KANEKO Shohei, FUKUSHIMA Takaaki, YAMANE Keisuke, FUJIKATA Junichi, ISHIKAWA Yasuhiko. AlN film by reactive sputtering as a stressor for Ge photonic devices on Si. 電子情報通信学会技術研究報告(Web). 2023. 123. 41(ED2023 1-9)
-
古家聖輝, 葛谷樹矢, PIEDRA-LORENZANA Jose A., 飛沢健, 山根啓輔, 石川靖彦. Effect of Ge Epitaxial Buffer Layer on Solid Phase Growth of Ge on Si. 電子情報通信学会技術研究報告(Web). 2023. 123. 41(ED2023 1-9)
ｍore...
Lectures and oral presentations (46)：
-
Franz-Keldysh Effect in Lateral pin Photodetectors of Ge Strip on Si at C-, L-, and U-band Wavelengths
(2024 IEEE Silicon Photonics Conference 2024)
-
Effect of Si cap layer on the lattice strain in a Ge wire structures grown on Si substrate
(2024)
-
引張ひずみを増強したGe層を用いたSi上フリースペース近赤外受光器の特性評価
(第21回赤外放射応用関連学会年会 2024)
-
CVD Growth of SiGe Layer on Bulk Si for Optical Waveguide Application
(Photonic Device Workshop 2023 (PDW2023) 2023)
-
Formation of TEOS-SiOx film by PECVD for Si Photonics Applications
(Photonic Device Workshop 2023 (PDW2023) 2023)
ｍore...
Association Membership(s) (1)：
THE JAPAN SOCIETY OF APPLIED PHYSICS
