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J-GLOBAL ID：202301000590497930   Update date: May. 26, 2024

Endo Kazuhiko

Endo Kazuhiko
Affiliation and department：
Tohoku University

About Tohoku University


Job title： Professor
Research theme for competitive and other funds  (2)：
  • 2020 - 2025 High-mobility Semiconductor Devices due to Control of Phonon Field caused by Defect-free Nano-periodic Structures
  • 2015 - 2019 A study of nanostructure memory devices and their integrated circuits toward massively parallel analog brain-like LSI
Papers (176)：
  • Aditya Saha, Ryuji Oshima, Daisuke Ohori, Takahiko Sasaki, Hirokazu Yano, Hidenori Okuzaki, Takashi Tokumasu, Kazuhiko Endo, Seiji Samukawa. Effect of Interfacial Oxide Layers on Self-Doped PEDOT/Si Hybrid Solar Cells. Energies. 2023. 16. 6900-1-6900-14
  • Shota Nunomura, Hiroyuki Ota, Toshifumi Irisawa, Kazuhiko Endo, Yukinori Morita. Defect generation and recovery in high-k HfO2/SiO2/Si stack fabrication. Applied Physics Express. 2023
  • Tomoki Harada, Daisuke Ohori, Kazuhiko Endo, Seiji Samukawa, Tetsuo Ikari, Atsuhiko Fukuyama. Lifetime of photoexcited carriers in space-controlled Si nanopillar/SiGe composite films investigated by a laser heterodyne photothermal displacement method. Journal of Applied Physics. 2023. 133. 12
  • Alvin Loke, Mitsuya Fukazawa, Kazuhiko Endo. 2023 IEEE Symposium on VLSI Technology and Circuits [Conference Reports]. IEEE Solid-State Circuits Magazine. 2023
  • Beibei Ge, Daisuke Ohori, Yi Ho Chen, Takuya Ozaki, Kazuhiko Endo, Yiming Li, Jenn Hwan Tarng, Seiji Samukawa. Room-temperature and high-quality HfO2/SiO2gate stacked film grown by neutral beam enhanced atomic layer deposition. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2022. 40. 2
ｍore...
Books (7)：
  • Phenyl silica glass for formation of porous dielectric film
    1999
  • Time-dependent reliability of the interface between a-C : F and inorganic dielectrics
    1998
  • Copper damascene using low dielectric constant fluorinated amorphous carbon interlayer
    1998
  • Aluminum wiring reliability of fluorinated amorphous carbon interlayer
    1998
  • Fluorinated amorphous carbon thin films grown from C4F8 for multilevel interconnections of integrated circuits
    1997
ｍore...
Lectures and oral presentations  (128)：
  • Hydrogen Iodide (HI) Neutral Beam Etching for InGaN/GaN Micro-LED
    (Proceedings of the IEEE Conference on Nanotechnology 2022)
  • Surface wettability of nanopillar array structures fabricated by biolate ultimate top-down processes
    (Proceedings of the IEEE Conference on Nanotechnology 2021)
  • Si Nanopillar/SiGe Composite Structure for Thermally Managed Nano-devices
    (Proceedings of the IEEE Conference on Nanotechnology 2021)
  • Surface wettability of nanopillar array structures fabricated by bio-template ultimate top-down processes
    (2021 IEEE 21ST INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE NANO 2021) 2021)
  • Toward Long-coherence-time Si Spin Qubit: The Origin of Low-frequency Noise in Cryo-CMOS
    (Digest of Technical Papers - Symposium on VLSI Technology 2020)
ｍore...
Work history (3)：
  • 2022/11 - 現在 東北大学 流体科学研究所
  • 2004/04 - 2022/11 National Institute of Advanced Industrial Science and Technology
  • 1993/04 - 2004/03 NEC Corporation
Committee career (16)：
  • 2023/07 - 現在 Symposium on VLSI Technology and Circuits Technical Program Chair
  • 2021/03 - 現在 電気学会 ナノエレクトロニクス機能化・応用技術調査専門委員会 委員長
  • 2021 - 現在 JSAP The System Device Roadmap Committee of Japan Steering Committee
  • 2020 - 現在 Advanced Metallization Conference Program Committee
  • 2009 - 現在 Silicon Nanoelectronics Workshop Program Committee
Show all
Awards (3)：
  • 2016/10 - IEEE IEEE Nano 2016 Best Paper Award
  • 2003/10 - ADMETA AWARD 2003
  • 1998 - 応用物理学会 応用物理学会講演奨励賞
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