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J-GLOBAL ID：200901003342206775   Update date: Aug. 23, 2024

EIJI KUSANO

クサノ エイジ | EIJI KUSANO
Affiliation and department：
Kanazawa Institute of Technology Kanazawa Institute of Technology College of Bioscience and Chemistry Department of Applied Chemistry

About Kanazawa Institute of Technology Kanazawa Institute of Technology College of Bioscience and Chemistry Department of Applied Chemistry


Research field  (1)： Semiconductors, optical and atomic physics
Research keywords  (2)： Thin Film Properties ,  Sputtering Process
Research theme for competitive and other funds  (10)：
  • 2015 - 2018 Mechanisms involved in anion defect formation in reactive sputte-deposition of fluoride and sulfide thin films and the surpression of the fformation
  • 2012 - 2015 Sputter deposition of sulfide solar-cell absorber thin films by using a hot-wall reflector toward low-temperature low-cost fabrication process
  • 2004 - 2006 表面プラズモン共鳴現象を用いたエレクトロニックノーズシステムの機能設計と構築
  • 2004 - 2006 Intelligent Odor and Taste Sensor System with Molecular Recognition Ability and Its Application
  • 2000 - 2002 Functional Design of Plasma-Polymerized Organic Thin Films and Its Application to an Electronic Nose
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Papers (88)：
  • Eiji Kusano. Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg-CF4, Mg-O2, and Ti-O2 discharges by probe measurements. Journal of Vacuum Science & Technology A. 2024. 42. 2
  • Eiji Kusano. Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films. Journal of Vacuum Science & Technology A. 2022. 40. 5. 053405-1-053405-14
  • Eiji Kusano. Growth of flat-topped, mound-shaped grains with voids when depositing silver thin films at high substrate temperatures using direct-current magnetron sputtering. Journal of Vacuum Science & Technology A. 2022. 40. 1. 013410-1-013410-12
  • Eiji Kusano. Discharge characteristics of electronegative Mg-CF4 direct current magnetron sputtering by probe measurements. Journal of Applied Physics. 2021. 129. 23. 233305-1-233305-20
  • KUSANO EIJI. Structure-Zone Modeling of Sputter-Deposited Thin Films: A Brief Review. Applied Science and Convergence Technology. 2019. 28. 6. 179-185
ｍore...
MISC (18)：
  • Eiji KUSANO. Development of a New Career Planning Education accommodatingto Diversified Occupation of Engineering Graduates - From of the Viewpoint of a Career Development Adviser. KIT progress. 2006. 11. 77-87
  • KUSANO Eiji, NANTO Hidehito, TANIGUCHI Masahiro. (149)"Monodukuri" Project Lab Course Practicing Preparation, Evaluation, and Planning : Preparation and evaluation of semiconductor thin films by sputtering. 2004. 16. 295-296
  • HAYASHI T., KIKUCHI N., KUSANO E., NANTO H., KINBARA A. Polymeric thin films with low dielectric constant deposited by r.f. magnetron sputtering. IEICE technical report. Component parts and materials. 2001. 101. 395. 101-106
  • KISHIO E., KIKUCHI N., KUSANO E., NANTO H., KINBARA A. Nb doped SnO_2 transparent conductive oxide films for analog type touch panels. IEICE technical report. Component parts and materials. 2000. 100. 396. 47-52
  • 金原 粲, 菊地 直人, 草野 英二. 薄膜の付着評価法 (特集1 試験・測定技術). 月刊トライボロジ. 2000. 14. 6. 20-22
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Books (6)：
  • 気泡・ボイドの発生メカニズムと未然防止・除去技術
    株式会社技術情報協会 2014
  • ドライプロセスによる表面処理・薄膜形成の基礎 表面技術協会
    コロナ社 2013
  • スパッタリングの基礎と応力発生メカニズム・密着力の向上
    技術情報協会 2008
  • 生産現場・開発現場において役立つ薄膜作製技術 おわりに-これからの薄膜作成技術-
    (株)リアライズ理工センター 2006
  • 生産現場・開発現場において役立つ薄膜作製技術 第2章 基盤技術・薄膜作成技術 第4節 化学気相成長法 1.化学気相成長法の概要
    (株)リアライズ理工センター 2006
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Lectures and oral presentations  (9)：
  • Electronegativity of Mg-CF4 reactive sputter discharge
    (18th International Conference on Reactive Sputter Deposition RSD 2019)
  • 3Ep12 Mg-CF4直流反応性スパッタリング放電における負イオン形成と薄膜再スパッタリング
    (2019)
  • [18p-C309-8] Mg-CF4直流反応性スパッタリング放電における負のプラズマ電位の発生
    (2019年第80回応用物理学会秋季学術講演会 2019)
  • Revisitation of the structure zone model of sputter-deposited thin films
    (The 15th International Symposium on Sputtering and Plasma Processes 2019)
  • Model calculation and visualization of time-dependent reactive gas mass balance change in Ti-O2 reactive sputtering,” 16th International Conference on Reactive Sputtering
    (16th International Conference on Reactive Sputtering 2017)
ｍore...
Education (2)：
  • 1981 - 1983 Kobe University Graduate School, Division of Engineering
  • 1977 - 1981 Kobe University Faculty of Engineering Department of Industrial Chemistry
Professional career (1)：
  • Doctor of Engineering (The University of Tokyo)
Work history (2)：
  • 2001 - Professor, Kanazawa Inst. Technol
  • 1996 - 2000 Associate Professor, Kanazawa Inst. Technol
Committee career (17)：
  • 2022/09 - 現在 The international union for vacuum science, technique, and applications Division of Surface Engineering, Committee Member (Representative from Japan)
  • 2022/08 - 現在 公益社団法人 日本表面真空学会 国際連携委員会委員
  • 2004/04 - 現在 日本ファインセラミックス協会 規格化委員会 薄膜・コーティング部門委員長
  • 2021/01 - 2022/09 Intl.Union. Vacuum Science, Technique, and Applications 22th Intl. Vacuum Congress Programming Committee, Member
  • 2007/01 - 2021/12 表面技術協会 評議員
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Association Membership(s) (6)：
Society of Vacuum Coaters ,  American Vacuum Society ,  公益社団法人日本化学会 ,  The Surface Finishing Society of Japan ,  The Japan Society of Vacuum and Surface Science ,  The Japan Society of Applied Physics
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