Rchr
J-GLOBAL ID：200901010233948148   Update date: Nov. 22, 2024

Tsutomu Muranaka

ムラナカ ツトム | Tsutomu Muranaka
Affiliation and department：
University of Yamanashi Graduate Faculty of Interdisciplinary Research Faculty of Engineering, Electrical and Electronic Information Engineering (Basic Education Center)

About University of Yamanashi Graduate Faculty of Interdisciplinary Research Faculty of Engineering, Electrical and Electronic Information Engineering (Basic Education Center)


Job title： Professor
Research field  (1)： Electric/electronic material engineering
Research keywords  (1)： Semiconductor Engineering, Crystals Science and Technology, Solid State Electronic Devices, Semiconductor Nanostructures, II- VI Compounds and related Materials
Research theme for competitive and other funds  (8)：
  • 2018 - 2021 Band structure control of multi-band gap semiconductors and its application to solar cell
  • 2016 - 2019 Development of ZnO-based semiconductor flexible device fabrication processes by using atomic-oxygen-assisted molecular beam epitaxy growth
  • 2015 - 2018 Control of band structure of multiple band gap semiconductor and its application to high-efficiency solar cell
  • 2011 - 2013 Control of band structure of multiple band gap semiconductor and its application to high-efficiency solar cell
  • 2009 - 2011 Development of ZnO-based Thin Film Transistors with Ultra-thin Al_2O_3 Films as Gate Dielectrics
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Papers (32)：
  • Motohito Hori, Yoshinari Ikeda, Tomoyuki Yamazaki, Tsutomu Muranaka, Yoichi Nabetani. Research on Dielectric Breakdown Voltage and Electric Field Strength at Triple Junctions on Insulating Substrates for Power Modules. Journal of The Japan Institute of Electronics Packaging. 2023. 26. 1. 167-171
  • Hayato Nakano, Tsutomu Muranaka, Yoichi Nabetani. Minimizing Thermal Imbalance of RC-IGBT by Bonding Technology. IEEJ Journal of Industry Applications. 2022. 11. 6. 771-778
  • Motohito Hori, Katsumi Taniguchi, Yuichiro Hinata, Mai Saitou, Yoshinari Ikeda, Tomoyuki Yamazaki, Tsutomu Muranaka, Yoichi Nabetani. Relationship between Electric Field Strength Distribution and Dielectric Breakdown Points in Insulating Substrates of Power Modules. IEEJ Transactions on Fundamentals and Materials. 2022. 142. 7. 328-334
  • Lianhua Jin, Sota Mogi, Tsutomu Muranaka, Eiichi Kondoh, Bernard Gelloz. Characterization of thin films from reflection and transmission ellipsometric parameters. Japanese Journal of Applied Physics. 2022. 61. 1. 018004-018004
  • Hayato Nakano, Tsutomu Muranaka, Yoichi Nabetani. Improvement of Thermal Resistance by Cooling Effect of RC-IGBT Non-operative Region. IEEJ Transactions on Industry Applications. 2021. 141. 11. 889-894
ｍore...
MISC (8)：
  • UTSUGI Y., TAKAGI S., OHARA T., MURANAKA T., NABETANI Y., MATSUMOTO T., KATO T. MBE growth of γ-In_2Se_3 on GaAs (001) substrates. Journal of the Japanese Association of Crystal Growth. 2006. 33. 4. 275-275
  • FUKUSHI Tetsuo, KIMURA Takeshi, MURANAKA Tsutomu, HASEGAWA Hideki. High-Density Integration of InP-based Quantum Wire Networks by Selective MBE Growth. Technical report of IEICE. SDM. 2004. 103. 630. 17-22
  • MURANAKA T., ITO A., JIANG C., HASEGAWA H. Formation of InGaAs Ridge Quantum Wire Network Structures Grown by Selective MBE and Its Device Application. IEICE technical report. Electron devices. 2002. 101. 618. 53-58
  • JIANG Chao, MURANAKA Tsutomu, HASEGAWA Hideki. Structural and Optical Properties of 10nm-Class InGaAs Ridge Quantum Wire Arrays with Sub-Micron Pitches Grown by Selective MBE on Patterned InP Substrate. 2001. 2001. 318-319
  • MURANAKA T., ITO A., JIANG C., HASEGAWA H. Fabrication of InGaAs Ridge Quantum Structures Grown by Selective MBE and their Device Applications. IEICE technical report. Electron devices. 2001. 100. 641. 17-23
ｍore...
Patents (1)：
  • 縦型成膜装置(ロール・ツー・ロール垂直搬送水平成膜方式による小型機能性薄膜製造装置)
Lectures and oral presentations  (68)：
  • フレキシブルPET基板上にプラズマ支援分子線堆積したGZO透明導電膜の結晶構造評価
    (第4回結晶工学xISYSE合同研究会 2021)
  • フレキシブルPET基板上GZO透明導電膜のプラズマ支援分子線堆積における添加ガス効果
    (第4回結晶工学xISYSE合同研究会 2021)
  • ロール・ツー・ロール式プラズマ支援堆積法によるGZO透明導電膜形成
    (SEMICON JAPAN 2021, Academia 2021)
  • Formation and characterization of GZO transparent conductive films on flexible substrates by using plasma-assisted molecular beam deposition (7)
    (The 82st JSAP Autumn Meeting, 2021 2021)
  • Formation and characterization of GZO transparent conductive films on flexible substrates by using plasma-assisted molecular beam deposition (6)
    (The 68th JSAP Spring Meeting, 2019 2021)
ｍore...
Education (2)：
  • - 2002 Hokkaido University 工学研究科 電子情報工学専攻
  • - 1996 Tokyo University of Science 理学部 応用物理学科
Professional career (2)：
  • Ph.D. in Engineering (Hokkaido University)
  • 博士(工学) (北海道大学)
Awards (1)：
  • 2004/09 - 応用物理学会 講演奨励賞 ECR-RIBEを用いた窒化ガリウム系ナノ構造の作製とそのデバイス応用
Association Membership(s) (2)：
JSAP, Division of Crystals Science and Technology ,  IEICE, Electronics Society
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