Rchr

J-GLOBAL ID：200901029116852027 Update date: Apr. 24, 2024

Nohira Hiroshi

ノヒラヒロシ | Nohira Hiroshi

Affiliation and department：
Job title： Professor
Other affiliations (1)：

Tokyo City University Graduate School Research Division in Engineering, Electrical and Electronic Engineering, Tokyo City University, Graduate School of Engineering, Electrical and Electronic Engineering

Research field (4)： Electric/electronic material engineering , Thin-film surfaces and interfaces , Nanobioscience , Nanomaterials

Research keywords (4)：表面界面物性 , 電子・電気材料工学 , Surface Physics , Electronic and Electric Materials Engineering.

Research theme for competitive and other funds (29)：

2019 - 2022 Two-terminal resistance change memory based on interface dipole modulation
2016 - 2019 Multi-stack interface dipole modulation memory and analog operation dynamics
2015 - 2018 Study of terminal structure and electronic band structure of diamond surface by angle-resolved photoelectron spectroscopy
2014 - 2017 XPS Study on ultra thin SiO2 film formed on Si substrates with several surface orientations
2009 - 2012 Demonstration of innovative Germanium optoelectronic devices and developments of simulation technologies

2009 - 2011 Study of high-κ/strained-Ge channel and high-κ/strained-Si channel using X-ray Photoelectron Spectroscopy

2009 - 2011 Study on dielectric constant of ultrathin SiO2 by using XPS and first-principles calculation

2007 - 2009 Determination of Insulator/Si Interface Structure by Extremely Sensitive and Highly Resolved Interfacial Analyses

2007 - 2008 Characterization of high-k gate insulators / Ge channel interface using X-ray photoelectron spectroscopy

2007 - 2008 An Experimental Study of Dipole-Layer Formation at Metal-Oxide/Semiconductor Interfaces

2006 - 2008 Study on dielectric constant of ultrathin films in gate structures

2004 - 2005 Formation of High-Quality High-κ Dielectrics/Si Interface by Atomic Scale Control

2003 - 2005 Development of High Energy Photoelectron Spectroscopy and Its Application to Analyses of Chemical States at High-κ dielectric/Silicon Interface

2002 - 2003 Depth Profile of high-κ dielectrics/Si structure using AR-XPS

2001 - 2003 断面光電子分光法による非晶質シリコン酸化膜の組成および結合状態密度の深さ方向分析

1998 - 2000 Studies on Carrier Trap Levels at Ultrathin SiO_2/Si Interface and Its Relation with Microscopic Structures

1997 - 1998 酸化の進行に伴う酸化膜の価電子帯形成過程の角度分解X線光電子分光法による解明

1996 - 1997 水素終端されたシリコン面の初期酸化過程の角度分解紫外線光電子分光法による解明

1996 - 1997 Development of Ultra-smooth Si Surface by the Control of SiO_2/Si Interface Formation on an Atomic-Scale

1994 - 1995 Formation of Extremely Flat Silicon Oxide/Silicon Interface by the Thermal Oxidation of Hydrogen-Terminated Silicon Surface

1994 - 1994 原子スケールで平坦なシリコン表面上のAlの初期成長過程のX線光電子分光法による解明

1992 - 1993 Study on Initial Stage of Oxidation of Hydrogen-Terminated Silicon Surface and Structure of Interface between Ultra-thin Metal Film and Ultra-thin Silicon Oxide Film

1992 - 1992 原子レベルで平坦なシリコン表面の初期酸化過程のX線光電子分光法による解明

角度分解X線光電子分光法による高誘電体薄膜/半導体界面の評価

SiO2の価電子帯形成の初期過程の解明

シリコンの初期酸化過程の解明

AR-XPS Study on Chemical Bonding States of High-k Gate Stacks

Initial stage of SiO2 valence band formation

Initial Stage of Oxidation of Silicon Surfaces

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Papers (137)：

Tomoya Tsutsumi, Kazuki Goshima, Yoshiharu Kirihara, Tatsuki Okazaki, Akira Yasui, Kuniyuki Kakushima, Yuichiro Mitani, Hiroshi Nohira. Effects of plasma oxidation and plasma nitridation on chemical bonding state of AlScN evaluated by AR-HAXPES. Japanese Journal of Applied Physics. 2024. 63. 4. 04SP66-04SP66
Noriyuki Miyata, Kyoko Sumita, Akira Yasui, Ryousuke Sano, Reito Wada, Hiroshi Nohira. Electrically induced change in HfO2/1-monolayer TiO2/SiO2metal-oxide-semiconductor stacks: Capacitance-voltage and hard X-ray photoelectron spectroscopy studies. Applied Physics Express. 2021. 14. 7. 071005-071005
野平博司, 笹子知弥, 室隆桂之. Analysis of Effect of Plasma Nitridation on SiO₂/SiC by Angle-Resolved X-ray Photoelectron Spectroscopy. SPring-8/SACLA利用研究成果集(Web). 2020. 8. 2. 251-253
Takuji Takahashi, Daisuke Fujita, Hirokazu Fukidome, Ken Ichi Fukui, Hiroki Hibino, Masami Kageshima, Tadahiro Komeda, Ken Nakajima, Makoto Nakamura, Tomonobu Nakayama, et al. Atomically Controlled Surfaces, Interfaces and Nanostructures/Scanning Probe Microscopy. Japanese Journal of Applied Physics. 2019. 58. SI
R. Sano, S. Konoshima, K. Sawano, H. Nohira. Effect of strain on the binding energy of Ge 2p and 3d core level. Semiconductor Science and Technology. 2019. 34. 1

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MISC (203)：

野平博司, 桐原芳治, 辻口良太, 小山涼, 家城大輔, 中田和吉, 石川亮佑, 石川亮佑. XPS Evaluation of ALD-TiO₂ layer for perovskite/Si tandem solar cell application. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2022. 69th
石川亮佑, 石川亮佑, 家城大輔, 桐原芳治, 辻口良太, 小山涼, 中田和吉, 野平博司. Evaluation of ALD-TiO₂ layer for perovskite/Si tandem solar cell application. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2022. 69th
桐原芳治, 和田励虎, 辻口良太, 保井晃, 宮田典幸, 野平博司. Elucidation of Interface Dipole Modulation Mechanism by Hard X-ray Photoemission Spectroscopy. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2021. 68th. 2279-2279
辻口良太, 桐原芳治, 角嶋邦之, 保井晃, 野平博司. HAXPES evaluation of the chemical bond state of the elements in the polarization-inverted AlScN film. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd
桐原芳治, 辻口良太, 保井晃, 宮田典幸, 野平博司. Confirmation of Interface Dipole Modulation Generation by Hard X-ray Photoemission Spectroscopy. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd

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Books (2)：

Fundamental Aspects of Silicon Oxidation
Springer-Verlag Berlin Germany (総ページ数260) 2001
Fundamental Aspects of Silicon Oxidation
Springer-Verlag Berlin Germany 2001

Lectures and oral presentations (309)：

ラジカル窒化処理したSiO2/4H-SiCの窒素分布のXPSによる評価
(応用物理学会薄膜・表面物理分科会・シリコンテクノロジー分科会共催特別研究会「ゲートスタック研究会 -材料・プロセス・評価の物理-」(第19回研究会) (旧「極薄シリコン酸化膜の形成・評価・信頼性」研究会) 2014)
HXPESによるFe3 Si/Geヘテロ構造の評価
(応用物理学会薄膜・表面物理分科会・シリコンテクノロジー分科会共催特別研究会「ゲートスタック研究会 -材料・プロセス・評価の物理-」(第19回研究会) (旧「極薄シリコン酸化膜の形成・評価・信頼性」研究会) 2014)
高空間分解能HXPESによるSiGe価電子帯への一軸歪みの影響の検出
(応用物理学会薄膜・表面物理分科会・シリコンテクノロジー分科会共催特別研究会「ゲートスタック研究会 -材料・プロセス・評価の物理-」(第19回研究会) (旧「極薄シリコン酸化膜の形成・評価・信頼性」研究会) 2014)
ALD法を用いたLa2O3/In0.53Ga0.47As構造に及ぼす(NH4)2S表面処理の効果
(応用物理学会薄膜・表面物理分科会・シリコンテクノロジー分科会共催特別研究会「ゲートスタック研究会 -材料・プロセス・評価の物理-」(第19回研究会) (旧「極薄シリコン酸化膜の形成・評価・信頼性」研究会) 2014)
AR-XPS による4H-SiC の初期酸化過程の解明
(第61 回応用物理学会春季学術講演会 2014)

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Education (1)：

- 1991 Tokyo Institute of Technology Interdisciplinary Science and Engineering

Professional career (1)：

(BLANK) (Tokyo Institute of Technology)

Committee career (38)：

2014 - 2014 第20回ゲートスタック研究会 -材料・プロセス・評価の物理- プログラム委員
2014 - 2014 2014年国際固体素子・材料コンファレンス委員
2014 - 2014 2014 International Conference on Solid State Devices and Materials (SSDM2014) Member of Program Committee
2014 - 2014 20th Workshop on Gate Stacks - Physics in Materials, Fablication Processes and Characterization Member of Program Committee
2013 - 2013 2013 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY Member of Program Committee

2013 - 2013 2013年国際固体素子・材料コンファレンス委員

2013 - 2013 第19回ゲートスタック研究会 -材料・プロセス・評価の物理- 実行委員長

2013 - 2013 19th Workshop on Gate Stacks - Physics in Materials, Fablication Processes and Characterization Chair, Organizing Committee

2013 - 2013 2013 International Workshop on IWDTF-2013 DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY Member of Program Committee

2013 - 2013 2013 International Conference on Solid State Devices and Materials (SSDM2013) Member of Program Committee

2012 - 2012 2012年国際固体素子・材料コンファレンス委員

2012 - 2012 第18回ゲートスタック研究会 -材料・プロセス・評価の物理- プログラム委員長

2012 - 2012 18th Workshop on Gate Stacks - Physics in Materials, Fablication Processes and Characterization Chair, Member of Program Committee

2012 - 2012 2012 International Conference on Solid State Devices and Materials (SSDM2012) Member of Program Committee

2011 - 2012 (社)応用物理学会委員

2011 - 2012 The Japan Society of Applied Physics Member of editorial board

2011 - 2011 第17回ゲートスタック研究会 -材料・プロセス・評価の物理- 副プログラム委員長

2011 - 2011 2011年国際固体素子・材料コンファレンス委員

2011 - 2011 17th Workshop on Gate Stacks - Physics in Materials, Fablication Processes and Characterization Vice-Chair, Member of Program Committee

2011 - 2011 2011 International Conference on Solid State Devices and Materials (SSDM2011) Member of Program Committee

2010 - 2010 第16回ゲートスタック研究会 -材料・プロセス・評価の物理- プログラム委員

2010 - 2010 2011 International Workshop on IWDTF-11 DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY Member of Program Committee

2010 - 2010 16th Workshop on Gate Stacks - Physics in Materials, Fablication Processes and Characterization Member of Program Committee

2010 - 2010 2011 International Workshop on IWDTF-11 DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY Member of Program Committee

2004 - 2007 応用物理学会代議員

2004 - 2007 The Japan Society of Applied Physics Representative

2001 - 2003 応用物理学会常任幹事

2001 - 2003 The Japan Society of Applied Physics Organizer

2003 - 応用物理学会幹事

2003 - 日本表面科学会編集委員

2003 - The Japan Society of Applied Physics Organizer

2003 - The Surface Science Society of Japan Member of editorial board

1999 - 2000 応用物理学会幹事

1999 - 2000 The Japan Society of Applied Physics Organizer

1998 - 1999 応用物理学会幹事

1998 - 1999 The Japan Society of Applied Physics Organizer

1996 - 1998 応用物理学会常任幹事

1996 - 1998 The Japan Society of Applied Physics Organizer

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Association Membership(s) (33)：

第17回ゲートスタック研究会 -材料・プロセス・評価の物理- , 2013 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY , Materials Research Society , 2013年国際固体素子・材料コンファレンス , 応用物理学会薄膜・表面物理分科会 , 第16回ゲートスタック研究会 -材料・プロセス・評価の物理- , 2011年国際固体素子・材料コンファレンス , 応用物理学会シリコンテクノロジー分科会 , 日本表面科学会 , 第20回ゲートスタック研究会 -材料・プロセス・評価の物理- , The Electrochemical Society , 2014年国際固体素子・材料コンファレンス , (社)応用物理学会 , 2011 International Workshop on IWDTF-11 DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY , 2012年国際固体素子・材料コンファレンス , 応用物理学会 , 第19回ゲートスタック研究会 -材料・プロセス・評価の物理- , 第18回ゲートスタック研究会 -材料・プロセス・評価の物理- , 19th Workshop on Gate Stacks - Physics in Materials , 18th Workshop on Gate Stacks - Physics in Materials , 16th Workshop on Gate Stacks - Physics in Materials , 17th Workshop on Gate Stacks - Physics in Materials , 2011 International Workshop on IWDTF-11 DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY , 2013 International Workshop on IWDTF-2013 DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES SCIENCE AND TECHNOLOGY , 2011 International Conference on Solid State Devices and Materials (SSDM2011) , Thin Film and Surface Physics Division , 2014 International Conference on Solid State Devices and Materials (SSDM2014) , The Surface Science Society of Japan , 2012 International Conference on Solid State Devices and Materials (SSDM2012) , 2013 International Conference on Solid State Devices and Materials (SSDM2013) , The Japan Society of Applied Physics , Fablication Processes and Characterization , 20th Workshop on Gate Stacks - Physics in Materials

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