Rchr
J-GLOBAL ID：200901038662317581
Update date: Aug. 19, 2022
Minamikawa Toshiharu
ミナミカワ トシハル | Minamikawa Toshiharu
Affiliation and department：
Job title：
Head
Other affiliations (1)：
Homepage URL (1)：
http://www.irii.jp/
Research field (1)：
Electric/electronic material engineering
Research keywords (3)：
薄膜作製および評価
, 電子材料
, thin film
Research theme for competitive and other funds (2)：
- 2001 - 2004 Low temperqature catalytic CVD
- 2001 - 2003 低温触媒CVD装置の開発
MISC (2)：
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Minamikawa Toshiharu, Yonezawa Yasuto, Nakamura Takashi, Fujimori Yoshikazu, Masuda Atsushi, Matsumura Hideki. Annealing Effect of Pb(Zr, Ti)O3 Ferroelectric Capacitor in Active Ammonia Gas Cracked by Catalytic Chemical Vapor Deposition System. Jpn J Appl Phys. 1999. 38. 9. 5358-5360
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Minamikawa Toshiharu, Yonezawa Yasuto, Nakamura Takashi, Fujimori Yoshikazu, Masuda Atsushi, Matsumura Hideki. Annealing Effect of Pb(Zr,Ti)O3 Ferroelectric Capacitor in Active Ammonia Gas Cracked by Catalytic Chemical Vapor Deposition System. Jpn. J. Appl. Phys. Vol.38 (1999) 5358. 1999. 38. 9. 5358-5360
Association Membership(s) (2)：
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