NAKAJIMA TOHRU

Papers (1)：

M Sugiyama, T Iino, T Nakajima, T Tanaka, H Itoh, J Aoyama, Y Egashira, K Yamashita, H Komiyama, Y Shimogaki. Theoretical optimization of Al-CVD using elementary reaction simulation. FUNDAMENTAL GAS-PHASE AND SURFACE CHEMISTRY OF VAPOR-PHASE DEPOSITION II AND PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANFACTURING IV. 2001. 2001. 13. 284-291

Committee career (1)：

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