Research field (3):
Polymer materials
, Polymer chemistry
, Synthetic organic chemistry
Research keywords (3):
フォトレジスト
, 耐熱性樹脂
, 有機合成
Papers (22):
Takashi Doi, Tsutomu Shimokawa. Development of Positive Tone-Type Photosensitive Materials Based on A Phenolic Resin with A Low Coefficient of Thermal Expansion. Journal of Photopolymer Science and Technology. 2024. 37. 1. 101-107
Takashi Doi, Shotaro Sudo, Tsutomu Shimokawa. Investigation on polymer design to enhance dissolution inhibition effects of photochemical acid generators for hexafluoroisopropylalcohol-containing polystyrene in non-chemically amplified resists. Journal of Polymer Science. 2023. 61. 13. 1308-1317
Takashi Doi, Isao Nishimura, Masahiro Kaneko, Tsutomu Shimokawa. Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication. Journal of Photopolymer Science and Technology. 2022. 35. 4. 313-319
Development of low-residual-stress photosensitive adhesive materials for wafer-scale microfluidic device fabrication
(The 39nd International Conference of Photopolymer Science and Technology 2022)
Development of Photo-Patternable and Room Temperature Adhesive Materials
(2016)
Improvement of Post Exposure Delay of Photo-Patternable and Adhesive Materials for Wafer-Scale Microfluid
(The 32th International Conference of Photopolymer Science and Technology 2015)
Development of New Photosensitive Low CTE Materials
(The 32nd International Conference of Photopolymer Science and Technology 2015)