Rchr
J-GLOBAL ID:200901055043787745   Update date: Aug. 09, 2024

Ishikawa Kenji

イシカワ ケンジ | Ishikawa Kenji
Affiliation and department:
Job title: Professor
Other affiliations (1):
Research field  (1): Applied physics - general
Research keywords  (12): plasma diagnostics ,  In situ real time measurement ,  Sum-frequency generation spectroscopy ,  Infrared spectroscopy ,  Electron paramagnetic resonance ,  Electron spin resonance ,  Plasma agriculture ,  Plasma medicine ,  Plasma etching ,  Non-thermal Plasma Biochemistry ,  Non-thermal Plasma biology ,  Dry process
Research theme for competitive and other funds  (17):
  • 2024 - 2029 Plasma-driven Sciences: Dynamics and transports of biochemically reactive species
  • 2024 - 2029 Comprehensive study of plasma-driven molecular dynamics in seeds
  • 2021 - 2024 Spatiotemporal analysis of aqueous reaction field of plasma-generated free radicals
  • 2021 - 2024 Innovation in atomically controlled engineering of plasma etching technology with builiding a collaborative environment for theory, computation, and measurement
  • 2020 - 2024 Mechanism elucidation of spatio-temporal structure formation of sheath fluctuation using optically trapped fine particles in plasmas
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Papers (199):
  • Dhasiyan A.K, Amalraj F.W, Jayaprasad S, Shimizu N, Oda O, Ishikawa K, Hori M. Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition. Scientific Reports. 2024. 14. 1. 10861
  • Hu L, Ishikawa K, Nguyen T.T.N, Hsiao S.N, Hori M. Selective removal of single-layer graphene over double-layer graphene on SiO#D2#DR by remote oxygen plasma irradiation. Applied Surface Science. 2024. 669
  • Oehrlein G.S, Brandstadter S.M, Bruce R.L, Chang J.P, DeMott J.C, Donnelly V.M, Dussart R, Fischer A, Gottscho R.A, Hamaguchi S, et al. Future of plasma etching for microelectronics: Challenges and opportunities. Journal of Vacuum Science and Technology B. 2024. 42. 4
  • Minh N.Q, Van Nong N, Oda O, Ishikawa K, Hori M. Low-temperature growth at 225 °C and characterization of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition. Vacuum. 2024. 224
  • Tsutsumi, T, Asano, A, Kondo, H, Ishikawa, K, Sekine, M, Hori, M. #IIn situ#IR atom-resolved observation of Si (111) 7x7 surface with F radical and Ar ion irradiation simulated atomic layer etching. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2024. 42. 3
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Books (12):
  • シリコンと化合物半導体の超精密・微細加工プロセス技術 -工程別加工技術の基礎と最新動向-
    シーエムシー出版 2024 ISBN:9784781317571
  • Control of Plasma Behavior and Surface Reaction in High Aspect Ratio Etching
    2023 ISBN:9784861049828
  • Chapter 2. Physical and chemical basis of non-thermal plasma. In: "Plasma Medical Science"
    Academic Press 2018 ISBN:9780128150054
  • Chapter 5. "Plasma Diagnostics" In: "Cold Plasma in Food and Agriculture, Fundamentals and Applications"
    Academic Press 2016 ISBN:9780128013656
  • 7.2節 表面計測法 In: プラズマプロセス技術
    森北出版 2016 ISBN:9784627775619
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Lectures and oral presentations  (181):
  • 非平衡大気圧プラズマがゼブラフィッシュに及ぼす影響とその機構解明
    (第70回応用物理学会春季学術講演会 17p-A409-9 2023)
  • プラズマ活性乳酸リンゲル液によるがん細胞死経路上のオートファジー観察
    (第70回応用物理学会春季学術講演会 17a-A409-6 2023)
  • カーボンナノウォール足場上での電気刺激重畳培養におけるヒト間葉系幹細胞の形態変化
    (第70回応用物理学会春季学術講演会 17a-A409-2 2023)
  • C2F4の電子物性とPTFEの生成機構
    (第70回応用物理学会春季学術講演会 17p-A205-18 2023)
  • F2添加 Ar プラズマを用いた基板昇温下での AlGaN の原子層エッチング
    (第70回応用物理学会春季学術講演会 17p-A205-11 2023)
more...
Work history (2):
  • Nagoya University Low temperature plasma
  • Nagoya University Graduate School of Engineering Plasma Nanotechnology Research Center Designated professor
Association Membership(s) (4):
Society for Free Radical Research JAPAN ,  プラズマ核融合学会 ,  応用物理学会 ,  American Vacuum Society
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