Research field (3):
Electronic devices and equipment
, Electric/electronic material engineering
, Electrical power engineering
Research keywords (8):
CaF
, BP
, 結晶Si
, 太陽電池
, CaF
, BP
, Crystalline Silicon
, Solar Cells
Research theme for competitive and other funds (9):
2008 - ITOへの水素ラジカル照射に関する研究
2008 - Siのドライ放電加工に関する研究
2008 - 液体原料SiO2を用いた結晶シリコン表面パッシベーション
2006 - Wホットフィラメントを用いたSi/WSi2ウィスカー成長
1993 - 2004 Study of Crystalline Silicon Solar Cells
2002 - 熱電発電システムに関する研究
2000 - 太陽電池シミュレーター電源装置に関する研究
ホットフィラメントCVDによる結晶シリコン表面テクスチャー形成
Epitaxial Growth of compound Semiconductor using Hydrogen Etching Reaction
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MISC (309):
(33) Hiroshi Nagayoshi1, Spyros Diplas2, John ChariesWalmsley3, Niels Andersen4, Arne Karlsson2, Joachim Seland Graff2 , Vladimir Chirvony5, Juan M. Pastor5 and Alexander Ulyashin2 “One step formation of Nanostructures on Silicon Surfaces Using Pure Hydro
(30) H. Nagayoshi, H. Nordmark, S. Nishimura and K. Terashima, C. D. Marioara, J. C. Walmsley, R. Holmestad3 and A. Ulyashin, “Vapor-Solid-Solid Si Nano-Whiskers Growth Using Pure Hydrogen as Source Gas”, Thin Solid Films(2011) vol. 519, issue 14, pp. 46
(27) H. Nordmark, H. Nagayoshi, N. Matsumoto, S. Nishimura, K,. Terashima, C. D. Marioara, J. C. Walmsley, R. Holmestad, and A. Ulyashin “Si substrate texturing and vapor-solid Si nanowhiskers growth using pure hydrogen as source gas” J. Appl. Phys. 105,
(25) Hiroshi Nagayoshi, Heidi Nordmark, Randi Holmestad, Nobuo Matsumoto, Suzuka Nishimura, Kazutaka Terashima, John C. Walmsley3, and Alexander Ulyashin “Silicon Whisker Growth Using Hot Filament Reactor with Hydrogen as Source Gas” Jpn. J. Appl. Phys.,4
(4) H. Nagayoshi, C. H. Wong, T. Ueno, K. Kamisako, K. Kuroiwa, T. Shimada and Y. Tarui : "Generation Mechanism of Tensile Stress in a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique" Jpn. J. Appl. Phys. 31(1992)L1628-163