Rchr
J-GLOBAL ID：200901060374292871   Update date: Sep. 19, 2024

Habuka Hitoshi

ハブカ ヒトシ | Habuka Hitoshi
Homepage URL  (1)： http://www.habukalab.ynu.ac.jp/
Research field  (2)： Chemical reaction and process system engineering ,  Applied materials
Research keywords  (10)： Heating technology ,  Cleaning ,  Process ,  Reactor ,  Surface ,  Silicon Carbide ,  Silicon ,  Etching ,  Crystal Growth ,  Electronics materials
Research theme for competitive and other funds  (14)：
  • 2017 - 2020 Main and Side Reaction Design for Exceeding the chemical vapor deposition rate limit
  • 2013 - 2016 Entire process view for film formation by chemical vapor deposition
  • 2010 - 2012 Study on low temperature thin film formation method by controlling chemical bonds on solid surface
  • 2006 - 2008 水晶振動子法と多成分系有機物吸着汚染モデルによる表面吸着分子間相互作用測定法研究
  • 2004 - 2007 Etching technology for etching various materials
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Papers (231)：
  • Kenta Hori, Hiroki Kawakami, Hitoshi Habuka. Chemical Conditions of SiCNO Film Exposed to ClF3Gas. ECS Journal of Solid State Science and Technology. 2021. 10. 10
  • Miyu Haruguchi, Masaya Hayashi, Kenta Irikura, Hitoshi Habuka, Yoshinao Takahashi. Anticorrosive Behavior of Aluminum Nitride Surface Exposed to Chlorine Trifluoride Gas at High Temperatures. ECS Journal of Solid State Science and Technology. 2021. 10. 3. 034006
  • Masaya Hayashi, Keisuke Kurashima, Hitoshi Habuka, Akio Ishiguro, Shigeaki Ishii, Yoshiaki Daigo, Hideki Ito, Ichiro Mizushima, Yoshinao Takahashi. Recovery Method of Pyrolytic Carbon Surface after Exposure to Chlorine Trifluoride Gas. Advances in Chemical Engineering and Science. 2021. 11. 1. 65-76
  • Mitsuko Muroi, Mana Otani, Hitoshi Habuka. Boron-Silicon Film Chemical Vapor Deposition Using Boron Trichloride, Dichlorosilane and Monomethylsilane Gases. ECS Journal of Solid State Science and Technology. 2021. 10. 6
  • Hayashi Masaya, Mamyouda Takumi, Habuka Hitoshi, Ishiguro Akio, Ishii Shigeaki, Daigo Yoshiaki, Ito Hideki, Mizushima Ichiro, Takahashi Yoshinao. Design of a Silicon Carbide Chemical Vapor Deposition Reactor Cleaning Process Using Chlorine Trifluoride Gas Accounting for Exothermic Reaction Heat. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. 2020. 9. 10. 104008
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MISC (39)：
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Books (22)：
  • -5G/Beyond 5Gに向けた- 高速・高周波対応部材の最新開発動向
    技術情報協会 2021
  • Manufacturing Systems: Recent Progress and Future Directions
    Nova Science Publishers 2020
  • 最新実用真空技術総覧
    エヌ・ティー・エス 2019 ISBN:9784860435592
  • Silicon Epitaxial Reactor for Minimal Manufacturing
    "Epitaxy" Editor Miao Zhong 2017 ISBN:9789535152514
  • Polycrystalline Films
    Nova Publisher 2017 ISBN:9781536108187
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Lectures and oral presentations  (33)：
  • Transport Phenomena in a Slim Vertical CVD Reactor for Minimal Manufacturing
    (18th International Conference on Crystal Growth and Epitaxy 2016)
  • Increase in Silicon Film Deposition Rate in a SiHCl3-SiHx-H2 System
    (18th International Conference on Crystal Growth and Epitaxy 2016)
  • In Situ cleaning process of silicon carbide epitaxial reactor for removing film-type deposition formed on susceptor
    (International Conference on Silicon Carbide and Related Materials 2015 2015)
  • Etching rate behavior of 4H-silicon carbide epitaxial film using chlorine trifluoride gas
    (International Conference on Silicon Carbide and Related Materials 2015 2015)
  • Numerical evaluation of silicon epitaxial growth for 450mm Ø substrate
    (EuroCVD20 2015)
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Works (5)：
  • Patent on measurement method for organic species concentration
    2000 -
  • Patent surface cleaning Process of silicon
    1999 -
  • Patent on Surface condition for crystal growth
    1997 -
  • Patent on process for obtaining uniform thickness of crystal film
    1996 -
  • Patent on producing light emitting cliodes
    1989 -
Education (3)：
  • - 1996 Hiroshima University Graduate School, Division of Engineering Department of chemical engineering
  • - 1981 Kyoto University Graduate School, Division of Natural Science Department of chemistry
  • - 1979 Niigata University Faculty of Science Department of chemistry
Professional career (2)：
  • Master of Science (Kyoto University)
  • Doctor of Engineering (Hiroshima University)
Work history (6)：
  • 2022/04 - 現在 Reaction and Reactor Engineering laboratory President
  • 2022/04 - 現在 Yokohama National University Professor emeritus
  • 2002/04 - 2022/03 Professor, Yokohama National University
  • 2003/04 - 2004/03 九州大学先導物質科学研究所 非常勤講師
  • 2000/04 - 2002/03 Associate Professor, Yokohama National University
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Committee career (11)：
  • 2008/04 - 現在 第145委員会 委員
  • 2007/02 - 現在 反応工学部会CVD反応部会 企画幹事
  • 2006/04 - 現在 理事会 理事
  • 2006/04 - 現在 理事会 副理事長
  • 2020/02 - 2021/03 国立大学教育研究評価委員会 専門委員
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Awards (1)：
  • 2003 - 空気清浄協会、論文賞
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