Rchr
J-GLOBAL ID：200901067797246200
Update date: Jul. 06, 2022
Kojima Isao
コジマ イサオ | Kojima Isao
Affiliation and department：
National Institute of Advanced Industrial Science and Technology
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Homepage URL (1)：
http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=I23520214
MISC (40)：
ZY Pan, ZH Sun, Z Xie, JH Xu, Kojima, I, SQ Wei. Interfacial intermixing of TiN/Si3N4 super-hard multilayer films studied by fluorescence x-ray absorption fine structure. JOURNAL OF PHYSICS D-APPLIED PHYSICS. 2006. 39. 13. 2796-2802
ZY Pan, ZH Sun, Z Xie, JH Xu, Kojima, I, SQ Wei. Interfacial intermixing of TiN/Si3N4 super-hard multilayer films studied by fluorescence x-ray absorption fine structure. JOURNAL OF PHYSICS D-APPLIED PHYSICS. 2006. 39. 13. 2796-2802
RQ Tan, Y Azuma, Kojima, I. Comparative study of the interfacial characteristics of sputter-deposited HfO2 on native SiO2/Si (100) using in situ XPS, AES and GIXR. SURFACE AND INTERFACE ANALYSIS. 2006. 38. 4. 784-788
Misumi, I, S Gonda, T Kurosawa, Y Azuma, T Fujimoto, Kojima, I, T Sakurai, T Ohmi, K Takamasu. Reliability of parameters of associated base straight line in step height samples: Uncertainty evaluation in step height measurements using nanometrological AFM. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY. 2006. 30. 1. 13-22
Y Azuma, T Fujimoto, Kojima, I. Cleaning method for thickness metrology of SiO2 thin films on Si substrates by heating in atmosphere. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2005. 44. 11. 8256-8258
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