Rchr
J-GLOBAL ID:200901080185102906
Update date: May. 17, 2020
Shimizu Tomo
シミズ トモ | Shimizu Tomo
Affiliation and department:
Job title:
Lecturer
Homepage URL (1):
http://www.kagawa-nct.ac.jp/
Research field (1):
Electronic devices and equipment
Research keywords (1):
電子デバイス・電子機器
Research theme for competitive and other funds (2):
- 極微細素子の研究
- Study on Ultra-Small Devices
Papers (16):
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清水 共. 数学の基礎学力に対する現状報告2. 香川高等専門学校研究紀要 第9号. 2018. 125-128
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S.Nagaoka, M.Yamamoto, T.Tsuji, T.Shimizu, R.W.Johnston, H.Horibe, F.Shimokawa, T.Shikama, M.Rusop. Fundamental Study of the Simplified Micro Diffusion Bipolar Transistor as the Educational Resource. The 11th International Symposium on Advances in Technology Education. 2017. 275-278
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清水 共. 金属における電子比熱の近似計算. 香川高等専門学校研究紀要 第8号. 2017. 127-131
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清水 共, 森優策, 長岡史. 数値計算による半導体物性解析手法について2-静電ポテンシャルと波動関数分布の関係-. 香川高等専門学校研究紀要 第7号. 2016. 99-106
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清水 共, 森優策, 内海太禄. 数値計算による半導体物性解析手法について -量子力学の基礎-. 香川高等専門学校研究紀要 第6号pp.97~101. 2015
more...
MISC (40):
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H.Kunisawa, M.Yamamoto, T.Shimizu, R.W.Johnston, F.Shimokawa, H.Horibe, M.Rusop, S.Nagaoka. A study for reducing pattern position alignment error of a simplified photo lithography method for the nanotech platform established at the average science laboratory. The 10th International Conference on Nanoscience and Nanotechnology 2019 (NANO-SciTech 2019), Malaysia. 2019. 68-69
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S.Nagaoka, M.Yamamoto, T.Tsuji, K.Matsuda, T.Shimizu, R.W.Johnston, T.Shikama, F.Shimokawa, H.Horibe. Proposal for Reducing Pattern Position Alignment Error of A Simplified Photo Lithography Method for Education. The 12th International Symposium on Advances in Technology Educaton. 2018. 512-517
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N.Nagaoka, T.Tsuji, M.Yamamoto, T.Shimizu, R.W.Johnston, T. (Invited) A proposal the Simplified Educational Semiconductor Device Fabrication Process under Normal Air Environment. International Conference on Nanoscience & Nanotechnology 2018 (NANO-SciTech 2018), Program & Abstract Book. 2018. 13-14
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N.Takagaki, S.Nagaoka, T.Tsuji, M.Yamamoto, R.W.Johnston, H.Horibe, T.Shimizu. A p-n Junction for the Simplified nMOS FET Fabrication using Alignment-less Lithography. The International Seminar on Electronics Engineering and NANO Technology (ISEENT 2017),The program book of ISEENT2017, NIT Kagawa College, P-14. 2017
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R.Saionji, S.Nagaoka, T.Tsuji, M.Yamamoto, R.W.Johnston, H.Horibe, T.Shimizu. Boron Selective Thermal Diffusion for the Simplified pMOS FET Fabrication Process. The International Seminar on Electronics Engineering and NANO Technology (ISEENT 2017),The program book of ISEENT2017. 2017
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Education (2):
- - 1999 University of Tsukuba
- - 1999 University of Tsukuba
Professional career (1):
- (BLANK) (University of Tsukuba)
Association Membership(s) (2):
THE INSTITUTE OF ELECTRONICS, INFORMATION AND COMMUNICATION ENGINEERS
, 応用物理学会
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