Rchr
J-GLOBAL ID：200901083855590507   Update date: Sep. 10, 2024

Shimogaki Yukihiro

シモガキ ユキヒロ | Shimogaki Yukihiro
Affiliation and department：
The University of Tokyo The Graduate School of Engineering, Department of Materials Engineering

About The University of Tokyo The Graduate School of Engineering, Department of Materials Engineering


Homepage URL  (1)： http://www.dpe.mm.t.u-tokyo.ac.jp
Research field  (2)： Chemical reaction and process system engineering ,  Electronic devices and equipment
Research keywords  (2)： デバイスプロセス ,  Device Process
Research theme for competitive and other funds  (34)：
  • 2010 - 2012 Nano-capacitor fabrication process development by using supercritical fluid
  • 2007 - 2007 超臨界流体を利用したULSIカーボンナノチューブ配線用ナノ触媒粒子の高密度合成
  • 2004 - 2006 高信頼性ULSI多層配線形成CVDプロセスの開発
  • 2005 - 2005 面積選択MOCVDを活用したInGaAsP化合物半導体結晶成長機構の解析とマイクロレーザアレイの作製
  • 2002 - 2004 Research and development of semiconductor digital all-optical devices and integrated circuits
Show all
Papers (192)：
  • Noboru Sato, Jun Yamaguchi, Masahiro Koto, Hayato Kubo, Takanori Sugiyama, Takahito Tanibuchi, Momoko Deura, Takeshi Momose, Yukihiro Shimogaki. Theoretical study on gas-phase reactions during chemical vapor deposition of TixAl1-xN from TiCl4, AlCl3, and NH3. International Journal of Chemical Kinetics. 2024
  • Jun Yamaguchi, Noboru Sato, Atsuhiro Tsukune, Takeshi Momose, Yukihiro Shimogaki. Atomic Layer Deposition of Cobalt Film from Dicobalt-hexacarbonyl-tert-butylacetylene and Hydrogen. ECS Journal of Solid State Science and Technology. 2023. 12. 11. 114003-114003
  • Momoko Deura, Takuya Nakahara, Wan Chi Lee, Takeshi Momose, Yoshiaki Nakano, Masakazu Sugiyama, Yukihiro Shimogaki. Effect of layer structure of AlN interlayer on the strain in GaN layers during metal-organic vapor phase epitaxy on Si substrates. Journal of Applied Physics. 2023. 133. 16
  • Kohei Shima, Yuhei Otaka, Noboru Sato, Yuichi Funato, Yasuyuki Fukushima, Takeshi Momose, Yukihiro Shimogaki. Kinetic Study on Heterogeneous Nucleation and Incubation Period during Chemical Vapor Deposition. The Journal of Chemical Physics. 2023. 158. 124704-1-12
  • Yuyuan Huang, Momoko DEURA, Yusuke Shimoyama, Yukihiro Shimogaki, Takeshi Momose. Supercritical fluid deposition for conformal Cu film formation on sub-millimeter-scale structures used to fabricate terahertz waveguides. Applied Physics Express. 2022
ｍore...
MISC (403)：
  • 奥友則, 百瀬健, 霜垣幸浩, 出浦桃子. Mechanism of void formation in the nitride layer grown on SiC/Si substrate. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2022. 69th
  • 山口潤, 佐藤登, 出浦桃子, 百瀬健, 霜垣幸浩. CCTBAを用いたCo-ALDプロセスの検討. 化学工学会秋季大会研究発表講演要旨集(CD-ROM). 2022. 53rd
  • 佐藤登, 根藤佳史, 大高雄平, 福島康之, 出浦桃子, 百瀬健, 霜垣幸浩. 理論的検討に基づいたSiC-CVIプロセスにおける炭素種の表面反応モデル構築. 化学工学会年会研究発表講演要旨集(CD-ROM). 2021. 86th
  • ZHANG Jin, 出浦桃子, 百瀬健, 霜垣幸浩. Multiscale simulation framework for chemical vapor deposition in nonlinear surface reaction kinetics case. 化学工学会年会研究発表講演要旨集(CD-ROM). 2021. 86th
  • 大高雄平, 佐藤登, 福島康之, 出浦桃子, 百瀬健, 霜垣幸浩. SiCf/SiC CMC合成のための排出ガス改質再利用を含むSiC含浸プロセスの提案. 化学工学会秋季大会研究発表講演要旨集(CD-ROM). 2021. 52nd
ｍore...
Works (6)：
  • ULSI多層配線用バリアメタル形成CVDプロセスに関する研究
    2000 -
  • GSI微細構造制御を目指したドライプロセスの高度化
    2000 -
  • DRAMキャパシタ電極用バリアメタルCVDプロセスの開発
    2000 -
  • Kinetic study on barrier metal CVD for ULSI metallization
    2000 -
  • Development of Dry-process for fine structure control in Giga-Scale Integration
    2000 -
ｍore...
Professional career (1)：
  • (BLANK) (The University of Tokyo)
Association Membership(s) (5)：
ECS・IEEE・AVS・MRS ,  触媒学会 ,  日本セラミックス協会 ,  応用物理学会 ,  化学工学会
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