Rchr
J-GLOBAL ID:200901087780558276   Update date: Oct. 23, 2024

Fukumuro Naoki

フクムロ ナオキ | Fukumuro Naoki
Affiliation and department:
Job title: Research assistant
Homepage URL  (1): http://www.eng.u-hyogo.ac.jp/group/group39/
Research field  (2): Metallic materials ,  Material fabrication and microstructure control
Research keywords  (7): 透過電子顕微鏡 ,  水素誘起超多量空孔 ,  薄膜 ,  表面処理 ,  めっきプロセス ,  ナノ構造 ,  Electroless plating and Electroplating
Research theme for competitive and other funds  (14):
  • 2022 - 2025 Control of Hydrogen Incorporation into Metals and Synthesis of Superstoichiometric Hydrides by Electrochemical Reaction
  • 2017 - 2020 めっきにおける水素共析と水素誘起現象の機構解明
  • 2017 - 2019 めっきにおける水素共析と水素誘起現象の機構解明
  • 2014 - 2018 Green & Sustainable Development of Electroless Displacement Deposition of Noble Metal Nanoparticles on Silicon
  • 2014 - 2017 Behavior Analysis of Hydrogen-Induced Superabundant Vacancies in Electrodeposition of Metals and Its Application to Structural Control
Show all
Papers (120):
  • Naoki Fukumuro, Takeshi Kinoshita, Tomoya Hashimoto, Shinji Yae. Influence of Co-Deposited Hydrogen on Microstructure of Electrodeposited Platinum Films from Chloro-Complex Solution. Journal of the Japan Institute of Metals and Materials. 2024. 88. 10. 233-238
  • Takeshi Fukuda, Kenji Iimura, Takanori Yamamoto, Ryuki Tsuji, Maito Tanabe, Seiji Nakashima, Naoki Fukumuro, Seigo Ito. Ozone-Assisted Hydrothermal Synthesis Method of Sb-Doped SnO2 Conductive Nanoparticles for Carbon-Free Oxygen-Reduction-Reaction Catalysts of Proton-Exchange-Membrane Hydrogen Fuel Cells. Crystals. 2024. 14. 5. 462-462
  • Shinji Yae, Ayumu Matsumoto, Naoki Fukumuro. Electroless Displacement Deposition of Noble Metal Nanoparticles and Its Application for Functionalization of Silicon Surface. Journal of the Society of Powder Technology, Japan. 2023. 60. 12. 739-747
  • Ryota Saida, Tomohiro Shimizu, Takeshi Ito, Yukihiro Tominari, Shukichi Tanaka, Naoki Fukumuro, Shinji Yae, Shoso Shingubara. Electroless Plating of Ru Using Hydrazine Hydrate as a Reducing Agent. Journal of Electronic Materials. 2023. 52. 10. 6690-6698
  • Koichiro Nishizawa, Ayumu Matsumoto, Yasuyuki Nakagawa, Hitoshi Sakuma, Seiki Goto, Naoki Fukumuro, Shinji Yae. Comparison of Electroless Ni-P and Co-W-P Diffusion Properties Against GaAs Substrate. Journal of Electronic Materials. 2023. 52. 6. 4080-4090
more...
MISC (212):
  • 林 和磨, 福室直樹, 八重真治. ロッシェル塩浴からの無電解銅めっき膜中への水素共析に及ぼす添加剤の影響. 表面技術協会第146回講演大会講演要旨集. 2022. 107-107
  • 西澤弘一郎, 松本 歩, 福室直樹, 中川康幸, 佐久間 仁, 後藤清毅, 八重真治. GaAs単結晶基板と無電解Ni-Pめっき膜の界面反応のP濃度依存性. 表面技術協会第146回講演大会講演要旨集. 2022. 104-104
  • 藤野 毅, 福室直樹, 井田統章, 井田義明, 八重真治. 払拭電解研磨法によるステンレス鋼からのガス放出の低減 -ベーキング処理との比較-. 表面技術協会第146回講演大会講演要旨集. 2022. 95-95
  • 西澤弘一郎, 松本 歩, 福室直樹, 中川康幸, 佐久間 仁, 後藤清毅, 八重真治. GaAs基板上に形成した無電解Ni-Pめっき膜の応力評価. 第86回半導体・集積回路技術シンポジウム. 2022
  • 福室直樹. めっきにおける水素共析と水素誘起現象の解析. 表面技術協会 めっき部会7月例会. 2022
more...
Education (2):
  • - 1999 Tokyo Metropolitan University Graduate School of Engineering
  • - 1994 Tokyo Metropolitan University Faculty of Engineering
Professional career (1):
  • 博士(工学) (東京都立大学)
Work history (1):
  • 2016/04 - 現在 University of Hyogo
Awards (1):
  • 1996 - 社団法人 表面技術協会 第2回学術奨励講演賞
Association Membership(s) (3):
The Japan Institute of Light Metals ,  表面技術協会 ,  日本金属学会
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