Rchr
J-GLOBAL ID:200901093892674147
Update date: Dec. 18, 2024
Nakamura Katsumitsu
ナカムラ カツミツ | Nakamura Katsumitsu
Affiliation and department:
Job title:
Associate Professor
Research field (3):
Electronic devices and equipment
, Nanobioscience
, Nanomaterials
Research keywords (2):
無機薄膜材料
, Thin Films Material of Inorganic
Research theme for competitive and other funds (12):
- 2004 - 2008 気相成長法による配向性カーボンナノチューブの生成
- 2004 - 2008 Preparation of Oriented Carbon Nanotube by CVD
- 2001 - 2008 有機金属化学気相成長法による炭化ケイ素膜の作成
- 2001 - 2008 スパッタリングCVD法によるダイヤモンド系(窒化炭素)析出物の作製
- 2001 - 2008 Preparation of Silicon Carbide Films by Metal Organic Chemical Vapor Deposition
- 2001 - 2008 Preparation of Carbon Nitride Deposites by Supputering CVD
- 2001 - 2005 超伝導性二ホウ化マグネシウム(MgB2)薄膜作成法の開発
- 気相成長法による立方晶窒化ホウ素(c-BN)薄膜の作製
- 炭素フラーレン膜の作製
- 炭窒化ホウ素膜の作製
- Preparation of carbon Fullerens films
- Preparation of Boroncarbo Nitride thin films
Show all
MISC (114):
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Preparation of Cubic Boron Nitride Films by Micro-Wave Plasma CVD using BF3. 16th International Symposium of Boron Boride and Related Materials (Matsue, Japan). 2008
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Deposition of Cubic Boron Nitride Films by Plasma Torch CVD in N2-BF3 gas system. 16th International Symposium of Boron Boride and Related Materials (Matsue, Japan). 2008
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Preparation of MgB2 thin films by reactive sputtering with substrate bias. 16th International Symposium of Boron Boride and Related Materials (Matsue, Japan). 2008
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Preparation of Cubic Boron Nitride Films by Micro-Wave Plasma CVD using BF3. 16th International Symposium of Boron Boride and Related Materials (Matsue, Japan). 2008
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Deposition of Cubic Boron Nitride Films by Plasma Torch CVD in N2-BF3 gas system. 16th International Symposium of Boron Boride and Related Materials (Matsue, Japan). 2008
more...
Patents (4):
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六方晶窒化ホウ素幕の製造方法
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太鼓膜状六方晶窒化硼素膜の製造方法昭63-145777
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六方晶窒化ホウ素膜の応力制御方法
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フラーレンの分離精製装置及び分離精製法
Books (6):
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ホウ素・ホウ化物の基礎と応用
シーエムシー出版 2008
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セラミックスの辞典
朝倉書店 2008
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Boron Films
Boron Films Electric Refractory Materials Marcel Dekker, Inc. 2000
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Boron Films
Boron Films Electric Refractory Materials Marcel Dekker, Inc. 2000
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Preparation of Boron Nitride Films by Chemical Vapor Deposition
Material Science forum 1990
more...
Works (3):
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公開特許公報 特開平9-227111 発明の名称: フラーレンの分離精製装置及び分離精製法
1997 -
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公開特許公報 昭63-14577 発明の名称: 六方晶窒化ホウ素膜の製造方法
1988 -
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公開特許公報 昭63-14578 発明の名称: 太鼓膜状六方晶窒化ホウ素膜の製造方法
1988 -
Education (2):
- - 1967 Nihon University College of Humanities and Sciences
- - 1967 Nihon University Faculty of Liberal Arts and Science (Natural Sciences)
Professional career (1):
Association Membership(s) (5):
日本化学会
, 日本応用物理学会
, 日本金属学会
, 表面技術協会
, 電気化学協会
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