- 2022 - 2025 気体流および液体流を用いた弱減圧マイクロ波プラズマ生成と応用
- 2016 - 2019 Wide range radical production by atmospheric pressure microwave plasma with molecular gas and applications
- 2016 - 2018 Development of Inovative Measurement Technique of Radical Lifetime in Liquid
- 2013 - 2016 Production of meter-scale high density microwave plasma and elucisation of its physical mechanism
- 2012 - 2014 Magnet-free microwave sputter deposition with uniform target utilization
- 2009 - 2011 High Precision Measurement of Plasma Density in Atmospheric Pressure Plasma
- 2006 - 2007 Development of New Magnetron Plasma Source with Particle Energy Control
- 2003 - 2005 Development of Giant Plasma Processing Based on Large-Area Microwave Discharge
- 2003 - 2004 Surface Reaction Processes of Fluorocarbon Molecule and Fundamental Research on New Etching Process
- 2000 - 2002 Development of Large-area High-quality LCD Processing by Surface Wave Plasma
- 1998 - 2001 Study on Surface Reaction Processes Using High Performance Beam Device
- 1998 - 2000 Development of new wall control method and plasma-wall interaction in fluorocarbon plasmas
- 1997 - 1999 Lower-Temperature Deposition of Poly-crystalline Silicon Film by High-Density Plasma
- 1995 - 1997 Development of Selective Hydrogen Pumping Method Using Lithium Films
- 1995 - 1996 Diagnostic and Control of Silane Plasmas by Newlv Developed Radical Measurement Technique
- 1994 - 1995 Novel First-Wall Conditioning in Stationary Reactor Studies
- 1993 - 1994 Basic study on lithium coating and plasma-surface processes
- 1992 - 1994 Development of large-diameter RF plasmas under surface magnetic field
- 1992 - 1993 Optimization of Particle Control by Boronization
- 1989 - 1990 Development of Low-Energy Particle-Beam Sources for Super-fine Plasma Processing
- 1987 - 1988 Formation of Functional Thin Films by a Double Plasma Device
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