Art
J-GLOBAL ID:200902000584269822   Reference number:88A0592329

Novel polymeric dissolution inhibitor for the design of sensitive, dry etch resistant, base-developable resist.

高感度,耐ドライエッチ性の塩基現像レジストの設計のための新しいポリマ溶解抑制剤
Author (3):
Material:
Volume: 135  Issue:Page: 2328-2333  Publication year: Sep. 1988 
JST Material Number: C0285A  ISSN: 1945-7111  CODEN: JESOAN  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
Semi thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=88A0592329&from=J-GLOBAL&jstjournalNo=C0285A") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Materials of solid-state devices 

Return to Previous Page