Barrier layers for realization of high capacitance density in SrTiO<sub>3</sub> thin-film capacitor on silicon.

SAKUMA T; YAMAMICHI S; MATSUBARA S; YAMAGUCHI H; MIYASAKA Y

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J-GLOBAL ID：200902016400421825 Reference number：91A0171233

Barrier layers for realization of high capacitance density in SrTiO₃ thin-film capacitor on silicon.

Si上SrTiO₃薄膜キャパシタ中の高キャパシタンス密度実現バリア層

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Author (5)： , , , ,
Material：
Volume： 57 Issue： 23 Page： 2431-2433 Publication year： Dec. 03, 1990
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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金属-絶縁体-半導体構造【’81~’92】 , Oxide thin films , Semiconductor integrated circuit

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Barrier layers for realization of high capacitance density in SrTiO3 thin-film capacitor on silicon.

Barrier layers for realization of high capacitance density in SrTiO₃ thin-film capacitor on silicon.