Art
J-GLOBAL ID：200902017859063855
Reference number：87A0428715
Rarefied gas dynamics problems on fabrication processes of semiconductor films.
半導体膜の製造過程に関する希薄気体力学的問題
-
Publisher site
Copy service
{{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=87A0428715©=1") }}
-
Access JDreamⅢ for advanced search and analysis.
{{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=87A0428715&from=J-GLOBAL&jstjournalNo=K19870312") }}
Author (1)：
Material：
Page：
410-419
Publication year：
1986
JST Material Number：
K19870312
ISBN：
3-519-02622-8
Document type：
Proceedings
Article type：
原著論文
Country of issue：
Germany, Federal Republic of (DEU)
Language：
ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
JST classification (2)：
JST classification
Category name(code) classified by JST.
Rarefied gas dynamics
, Techniques and equipment of thin film deposition
Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
,
,
Return to Previous Page
