Art
J-GLOBAL ID：200902020610357264
Reference number：89A0586670
Diamond and silicon carbide thin films: Present status and potential as wide band gap semiconducting materials.
ダイヤモンド薄膜とシリコンカーバイド薄膜 広帯域ギャップ半導体素材としての現状と展望
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Author (1)：
Material：
Volume：
4
Issue：
2
Page：
81-103
Publication year：
1989
JST Material Number：
T0305A
ISSN：
0268-1900
Document type：
Article
Article type：
文献レビュー
Country of issue：
Switzerland (CHE)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films
, Materials of solid-state devices
Terms in the title (8)：
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