Electrostatic trapping of contamination particles in a process plasma environment.

CARLILE R N; GEHA S; O'HANLON J F; STEWART J C

Art

J-GLOBAL ID：200902022005642570 Reference number：91A0798338

Electrostatic trapping of contamination particles in a process plasma environment.

プロセスプラズマ環境における汚染粒子の静電捕獲

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Author (4)： , , ,
Material：
Volume： 59 Issue： 10 Page： 1167-1169 Publication year： Sep. 02, 1991
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Plasma diagnostics

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