Art
J-GLOBAL ID:200902023458430723   Reference number:92A0313571

Effects of Hydrogen or Nitrogen Implantation on Oxygen-Related Defects in Germanium.

酸素を含むゲルマニウムに対する水素あるいは窒素注入の影響
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Issue: 27  Page: 55-62  Publication year: Mar. 1992 
JST Material Number: S0952A  ISSN: 0386-7579  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Irradiational changes semiconductors  ,  Lattice defects in semiconductors 
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