Art
J-GLOBAL ID：200902026763412726   Reference number：82A0146130

Oxidation kinetics of TiN thin films.

TiN薄膜の酸化動力学
Author (3)：
WITTMER M

About WITTMER M

(Swiss Federal Inst. Technology)

About Swiss Federal Inst. Technology

, 
NOSER J

About NOSER J

(Swiss Federal Inst. Technology)

About Swiss Federal Inst. Technology

, 
MELCHIOR H

About MELCHIOR H

(Swiss Federal Inst. Technology)

About Swiss Federal Inst. Technology


Material：
Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)

About Journal of Applied Physics


Volume： 52  Issue： 11  Page： 6659-6664  Publication year： Nov. 1981 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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nitride

About nitride

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

,  Other noncatalytic reactions 
(CB06070U)

About Other noncatalytic reactions

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
TiN薄膜

About TiN薄膜

, 
酸化

About 酸化

, 
動力学

About 動力学


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