Art
J-GLOBAL ID:200902030857096051   Reference number:90A0851283

Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers.

ウエハの電気化学的および化学溶解によるシリコン量子細線アレイの製作
Author (1):
Material:
Volume: 57  Issue: 10  Page: 1046-1048  Publication year: Sep. 03, 1990 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=90A0851283&from=J-GLOBAL&jstjournalNo=H0613A") }}
JST classification (2):
JST classification
Category name(code) classified by JST.
半導体-半導体接触【’81~’92】  ,  Luminescence of semiconductors 

Return to Previous Page