Art
J-GLOBAL ID：200902031530321112
Reference number：89A0063248
The effects of oxygen contamination on the properties of reactively sputtered indium nitride films.
反応性スパッタ蒸着の窒化インジウム膜の性質に対する酸素混入の効果
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Author (3)：
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Material：
Volume：
6
Issue：
3 Pt.2
Page：
1730-1732
Publication year：
May. 1988
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films
Terms in the title (6)：
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