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J-GLOBAL ID:200902032941745645   Reference number:88A0060593

The effect of low pressure on the structure of LPCVD polycrystalline silicon films.

LPCVD多結晶シリコン皮膜の構造に対する低圧の影響
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Volume: 134  Issue: 10  Page: 2541-2545  Publication year: Oct. 1987 
JST Material Number: C0285A  ISSN: 1945-7111  CODEN: JESOAN  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Semiconductor thin films 
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